Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A2 | P23975 | 1/20 | 0.38 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.38 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.38 |
| ▸ | KIF11 | P52732 | 1/20 | 0.37 |
| ▸ | ACACB | O00763 | 2/20 | 0.34 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | PPARA | Q07869 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | IDO1 | P14902 | 1/20 | 0.33 |
| ▸ | PPARG | P37231 | 1/20 | 0.31 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19721617 | 0.93 | ALDH1A1 (0.38) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| SCHEMBL19721653 | 0.93 | ALDH1A1 (0.38) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| SCHEMBL26746 | 0.86 | SLC6A2 (0.44) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| Tromethamine SCHEMBL8920729 | 0.82 | MEN1 (0.36) | SLC6A2SLC6A4SLC6A3ACACBMEN1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6358514 | 0.81 | KIF11 (0.34) | KIF11ACACBMEN1KMT2APPARA | |
| SCHEMBL19353077 | 0.79 | SLC6A2 (0.38) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| SCHEMBL1176811 | 0.79 | SLC6A2 (0.38) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| SCHEMBL198046 | 0.78 | RIPK1 (0.43) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| SCHEMBL19339945 | 0.78 | MAPT (0.44) | SLC6A2SLC6A4SLC6A3KIF11ACACB | |
| SCHEMBL18866585 | 0.78 | MAPT (0.44) | SLC6A2SLC6A4SLC6A3KIF11ACACB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101034260-B | Photosensitive resin composition | DONGJIN SEMICOHEM CO LTD | 2012-07-18 | — | — | CN | claimed |
| CN-101034260-A | Photosensitive resin composition | DONGJIN SEMICHEM CO LTD (KR) | 2007-09-12 | — | — | CN | claimed |
| US-20250189895-A1 | METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-12 | — | — | US | disclosed |
| US-20250172872-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-05-29 | — | — | US | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-118829948-A | Method for manufacturing plating shaped article | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118742854-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-10-01 | — | — | CN | disclosed |
| WO-2024166559-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD | 信越化学工業株式会社 | 2024-08-15 | — | — | WO | disclosed |
| US-20240053680-A1 | PHOTOSENSITIVE DRY FILM, LAMINATED FILM, METHOD FOR PRODUCING LAMINATED FILM, AND METHOD FOR PRODUCING PATTERNED RESIST FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-15 | — | — | US | disclosed |
| CN-110647010-B | Resin composition, dry film, method for producing dry film, resist film, substrate, and method for producing plating molded article | 东京应化工业株式会社 | 2024-02-09 | — | — | CN | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-4795815-A | BACTERICIDES, MICROBIOCIDES | ELI LILLY AND COMPANY (US) | 1989-01-03 | — | — | US | disclosed |
| US-4734504-A | 1-alkylated diazolidinones | ELI LILLY AND COMPANY (US) | 1988-03-29 | — | — | US | disclosed |
| US-4734505-A | 1-(alkylated)-2-(acylated)diazolidinones | ELI LILLY AND COMPANY (US) | 1988-03-29 | — | — | US | disclosed |
| US-4716232-A | 1-(vinyl phosphonate adduct) pyrazolidinones | ELI LILLY AND COMPANY (US) | 1987-12-29 | — | — | US | disclosed |
| EP-0203723-A1 | 2,3-(dihydro)bicyclic pyrazolidinones | ELI LILLY AND COMPANY (US) | 1986-12-03 | — | — | EP | disclosed |
| EP-0203722-A1 | Bicyclic pyrazolidinones | ELI LILLY AND COMPANY (US) | 1986-12-03 | — | — | EP | disclosed |
| EP-0202794-A1 | 7-Substituted-2,3-(Dihydro) bicyclic pyrazolidinones | ELI LILLY AND COMPANY (US) | 1986-11-26 | — | — | EP | disclosed |
| EP-0202046-A1 | 7-Substituted bicyclic pyrazolidinones | ELI LILLY AND COMPANY (US) | 1986-11-20 | — | — | EP | disclosed |
| US-4560749-A | ANTIBIOTICS, BACTERICIDES | ELI LILLY AND COMPANY (US) | 1985-12-24 | — | — | US | disclosed |