SCHEMBL2099008

SCHEMBL2099008

CC(C)c1ccccc1[SiH](Cl)Cl

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 3/20 0.44
GABRB2 P47870 2/20 0.44
FAAH O00519 2/20 0.41
GABRG2 P18507 2/20 0.41
GABRB3 P28472 2/20 0.41
LMNA P02545 2/20 0.41
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
TSHR P16473 2/20 0.41
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
HPGD P15428 1/20 0.41
GABRB1 P18505 1/20 0.41
PTGS1 P23219 1/20 0.41
SLC6A2 P23975 1/20 0.41
HTR2C P28335 1/20 0.41
GABRA5 P31644 1/20 0.41
GABRA3 P34903 1/20 0.41
HTR2B P41595 1/20 0.41
GABRA2 P47869 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28741038 0.84 GABRA1 (0.43) GABRA1GABRB2FAAHGABRG2GABRB3
SCHEMBL2102459 0.79 TSHR (0.53) GABRA1GABRB2TSHRL3MBTL1
SCHEMBL9571247 0.77 TSHR (0.32) FAAHTSHRMGLL
SCHEMBL271795 0.76 GABRA1 (0.50) GABRA1GABRB2FAAHGABRG2GABRB3
SCHEMBL2194679 0.74 GABRA1 (0.43) GABRA1GABRB2FAAHGABRG2GABRB3
SCHEMBL5002926 0.73 GABRA1 (0.41) GABRA1GABRB2FAAHGABRG2GABRB3
SCHEMBL66162 0.73 GABRA1 (0.63) GABRA1GABRB2FAAHGABRG2GABRB3
SCHEMBL29429205 0.73 GABRA1 (0.63) GABRA1GABRB2FAAHGABRG2GABRB3
Water SCHEMBL10586200 0.70 GABRA1 (0.60) GABRA1GABRB2FAAHGABRG2GABRB3
Water SCHEMBL2581333 0.70 GABRA1 (0.60) GABRA1GABRB2FAAHGABRG2GABRB3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113292592-B Method for removing impurities of methyldichlorosilane and silicon tetrachloride in trimethylchlorosilane 天津大学 2023-02-03 CN disclosed
CN-113292592-A Method for removing impurities of methyldichlorosilane and silicon tetrachloride in trimethylchlorosilane 天津大学 2021-08-24 CN disclosed
US-8163460-B2 Underlayer coating forming composition for lithography containing polysilane compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-04-24 US disclosed
US-20080318158-A1 Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-12-25 US disclosed