SCHEMBL2194679

SCHEMBL2194679

CC[SiH](O)c1ccccc1C(C)C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 3/20 0.43
GABRB2 P47870 2/20 0.43
GABRG2 P18507 2/20 0.41
GABRB3 P28472 2/20 0.41
TSHR P16473 2/20 0.40
LMNA P02545 2/20 0.40
CA1 P00915 2/20 0.40
CA2 P00918 2/20 0.40
FAAH O00519 2/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
HPGD P15428 1/20 0.40
GABRB1 P18505 1/20 0.40
PTGS1 P23219 1/20 0.40
SLC6A2 P23975 1/20 0.40
HTR2C P28335 1/20 0.40
GABRA5 P31644 1/20 0.40
GABRA3 P34903 1/20 0.40
HTR2B P41595 1/20 0.40
GABRA2 P47869 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL271795 0.79 GABRA1 (0.50) GABRA1GABRB2GABRG2GABRB3TSHR
SCHEMBL2099008 0.74 GABRA1 (0.44) GABRA1GABRB2GABRG2GABRB3TSHR
SCHEMBL13720383 0.72 ACHE (0.39) TSHRCA1CA2CYP3A4CA9
SCHEMBL14841665 0.71 GABRA1 (0.38) GABRA1GABRB2GABRG2GABRB3TSHR
SCHEMBL28741038 0.68 GABRA1 (0.43) GABRA1GABRB2GABRG2GABRB3TSHR
SCHEMBL3625912 0.68 LIPG (0.35) GABRA1GABRB2
Hydrogen Peroxide SCHEMBL99126 0.67 GABRA1 (0.65) GABRA1GABRB2GABRG2GABRB3TSHR
Hydrogen Peroxide SCHEMBL20593356 0.67 GABRA1 (0.65) GABRA1GABRB2GABRG2GABRB3TSHR
Hydrogen Peroxide SCHEMBL35519 0.67 GABRA1 (0.65) GABRA1GABRB2GABRG2GABRB3TSHR
Hydrogen Peroxide SCHEMBL30120583 0.67 GABRA1 (0.65) GABRA1GABRB2GABRG2GABRB3TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8871422-B2 Negative-type photosensitive resin composition, pattern forming method and electronic parts HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2014-10-28 US disclosed
US-8758977-B2 Negative-type photosensitive resin composition, pattern forming method and electronic parts HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2014-06-24 US disclosed
US-20110171436-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ELECTRONIC PARTS HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2011-07-14 US disclosed
US-20090181224-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ELECTRONIC PARTS HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2009-07-16 US disclosed