Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | KCNN4 | O15554 | 3/20 | 0.32 |
| ▸ | ESR1 | P03372 | 2/20 | 0.32 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | KIF11 | P52732 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2543699 | 0.79 | CYP2C19 (0.39) | CYP2C19HIF1ATAAR1MAPK1TSHR | |
| SCHEMBL17710390 | 0.77 | CYP2C19 (0.47) | CYP2C19HIF1ATAAR1MAPK1TSHR | |
| SCHEMBL8397722 | 0.77 | TAAR1 (0.52) | CYP2C19HIF1ATAAR1MAPK1TSHR | |
| SCHEMBL6324960 | 0.72 | TSHR (0.42) | CYP2C19TAAR1TSHRALDH1A1KCNN4 | |
| SCHEMBL4302387 | 0.69 | CYP2C19 (0.52) | CYP2C19HIF1ATAAR1MAPK1TSHR | |
| SCHEMBL1502452 | 0.69 | TAAR1 (0.58) | CYP2C19HIF1ATAAR1MAPK1TSHR | |
| SCHEMBL28272853 | 0.69 | TAAR1 (0.46) | CYP2C19HIF1ATAAR1MAPK1TSHR | |
| SCHEMBL5097794 | 0.68 | NR3C2 (0.36) | CYP2C19HIF1ATAAR1MAPK1ALDH1A1 | |
| SCHEMBL5085357 | 0.67 | TAAR1 (0.56) | CYP2C19HIF1ATAAR1MAPK1TSHR | |
| SCHEMBL6015470 | 0.67 | TSHR (0.48) | CYP2C19HIF1ATAAR1MAPK1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250326936-A1 | ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM | MAXTERIAL INC (US) | 2025-10-23 | — | — | US | disclosed |
| US-12173166-B2 | Articles including surface coatings and methods to produce them | MAXTERIAL, INC. (US) | 2024-12-24 | — | — | US | disclosed |
| US-12109812-B2 | Ink jet printing method and ink jet printing apparatus | SEIKO EPSON CORPORATION (JP) | 2024-10-08 | — | — | US | disclosed |
| US-20230295827-A1 | COATINGS AND COATED SURFACES INCLUDING LOW-SURFACE ENERGY INORGANIC PARTICLES | MAXTERIAL INC (US) | 2023-09-21 | — | — | US | disclosed |
| US-11542621-B1 | Coatings and coated surfaces including low-surface energy inorganic particles | MAXTERIAL, INC. (US) | 2023-01-03 | — | — | US | disclosed |
| US-20220032618-A1 | Ink Jet Printing Method And Ink Jet Printing Apparatus | SEIKO EPSON CORPORATION (JP) | 2022-02-03 | — | — | US | disclosed |
| EP-3691894-A1 | ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM | Maxterial, Inc. (US) | 2020-08-12 | — | — | EP | disclosed |
| US-20190186035-A1 | ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM | MAXTERIAL INC (US) | 2019-06-20 | — | — | US | disclosed |
| US-10259208-B2 | Three-dimensional shaped object manufacturing device, method for manufacturing three-dimensional shaped object, and three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2019-04-16 | — | — | US | disclosed |
| WO-2019067950-A1 | ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM | MAXTERIAL, INC. (US) | 2019-04-04 | — | — | WO | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-7776397-B2 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090077798-A1 | METHOD FOR FORMING CONDUCTIVE POST, METHOD FOR MANUFACTURING MULTILAYERED WIRING SUBSTRATE, AND METHOD FOR MANUFACTURING ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090071706-A1 | METHOD FOR PRODUCING MULTILAYERED WIRING SUBSTRATE, MULTILAYERED WIRING SUBSTRATE, AND ELECTRONIC APPARATUS | SEIKO EPSON CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-20080317943-A1 | METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING ELECTRO-OPTICAL DEVICE, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | SEIKO EPSON CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-20080311285-A1 | CONTACT HOLE FORMING METHOD, CONDUCTING POST FORMING METHOD, WIRING PATTERN FORMING METHOD, MULTILAYERED WIRING SUBSTRATE PRODUCING METHOD, ELECTRO-OPTICAL DEVICE PRODUCING METHOD, AND ELECTRONIC APPARATUS PRODUCING METHOD | SEIKO EPSON CORPORATION (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20080032109-A1 | Method for Coating Blanks for the Production of Printed Circuit Boards (Pcb) | LEISING GUNTHER | 2008-02-07 | — | — | US | disclosed |
| US-20060019034-A1 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2006-01-26 | — | — | US | disclosed |
| US-20050287392-A1 | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |