Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PGR | P06401 | 1/20 | 0.32 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.32 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.32 |
| ▸ | HTR2A | P28223 | 1/20 | 0.32 |
| ▸ | HRH1 | P35367 | 1/20 | 0.32 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2101679 | 0.85 | PGR (0.33) | PGRADRA2AADRA2BHTR2AHRH1 | |
| SCHEMBL2101028 | 0.84 | AOC3 (0.32) | ADRA2BHTR2AHRH1KCNH2LMNA | |
| SCHEMBL2272374 | 0.78 | ADRA2B (0.33) | PGRADRA2AADRA2BHTR2AHRH1 | |
| SCHEMBL2101581 | 0.78 | PGR (0.33) | PGRADRA2AADRA2BHTR2AHRH1 | |
| SCHEMBL1313652 | 0.75 | LMNA (0.35) | LMNATRPA1 | |
| SCHEMBL2102454 | 0.75 | LMNA (0.35) | LMNATRPA1 | |
| SCHEMBL1315271 | 0.75 | LMNA (0.35) | LMNATRPA1 | |
| SCHEMBL2103364 | 0.74 | PGR (0.31) | PGRADRA2AADRA2BHTR2AHRH1 | |
| SCHEMBL1317173 | 0.73 | LMNA (0.34) | LMNATRPA1 | |
| SCHEMBL2101348 | 0.72 | TP53 (0.33) | ADRA2AKCNH2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |