SCHEMBL2102113

SCHEMBL2102113

CN(C)[SiH](c1ccccc1C(C)(C)C)N(C)C

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.41
TSHR P16473 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
CA2 P00918 1/20 0.38
GABRA1 P14867 1/20 0.33
GABRB2 P47870 1/20 0.33
KDM4E B2RXH2 1/20 0.33
KMT2A Q03164 1/20 0.33
KIF11 P52732 1/20 0.32
ALOX12 P18054 1/20 0.32
CRHBP P24387 1/20 0.30
CRHR2 Q13324 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2101737 0.79 ALDH1A1 (0.39) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL2103617 0.78 ALDH1A1 (0.38) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL988385 0.75 ALDH1A1 (0.46) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL17138351 0.73 TDP1 (0.44) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL450655 0.73 TDP1 (0.44) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL272815 0.73 ALDH1A1 (0.50) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL3298464 0.71 ALDH1A1 (0.43) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL2101133 0.70 ALDH1A1 (0.41) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL5000032 0.70 TDP1 (0.41) ALDH1A1TSHRTDP1CA2GABRA1
SCHEMBL29355273 0.69 ALDH1A1 (0.63) ALDH1A1TSHRTDP1CA2GABRA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed