Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.31 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.31 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2269971 | 0.90 | HTT (0.41) | HTTADRB2KCNN4SIGMAR1 | |
| SCHEMBL2101038 | 0.81 | HTT (0.33) | HTTADRB2KCNN4 | |
| SCHEMBL2267934 | 0.78 | TAAR1 (0.46) | ATMTAAR1SIGMAR1 | |
| SCHEMBL2102333 | 0.75 | CACNA2D1 (0.34) | SIGMAR1 | |
| SCHEMBL2274476 | 0.74 | KCNN4 (0.35) | HTTADRB2KCNN4SIGMAR1 | |
| SCHEMBL2103327 | 0.71 | HTT (0.33) | HTTADRB2ATMTAAR1KCNN4 | |
| SCHEMBL3682860 | 0.71 | TP53 (0.38) | — | |
| SCHEMBL2102885 | 0.68 | — | — | |
| SCHEMBL2103816 | 0.68 | KCNN4 (0.32) | KCNN4 | |
| SCHEMBL1274186 | 0.67 | LTA4H (0.38) | SIGMAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |