⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21025828 | 0.96 | — | — | |
| SCHEMBL21025659 | 0.96 | CHRM5 (0.31) | — | |
| SCHEMBL21024930 | 0.80 | ALDH1A1 (0.36) | — | |
| SCHEMBL25159191 | 0.79 | AR (0.39) | — | |
| SCHEMBL9926774 | 0.79 | AR (0.39) | — | |
| SCHEMBL23031896 | 0.79 | CTSK (0.36) | — | |
| SCHEMBL20997933 | 0.78 | ALDH1A1 (0.34) | — | |
| SCHEMBL25159192 | 0.78 | AR (0.38) | — | |
| SCHEMBL21397096 | 0.78 | SMN1; SMN2 (0.37) | — | |
| SCHEMBL16425280 | 0.76 | AR (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3486724-B1 | MIXED-TYPE PHOTOSENSITIVE RESIN AND PREPARATION METHOD THEREFOR | CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD (CN) | 2021-05-12 | — | — | EP | disclosed |
| US-10642155-B2 | Mixed-type photosensitive resin and preparation method therefor | CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD. (CN) | 2020-05-05 | — | — | US | disclosed |
| EP-3486724-A1 | MIXED-TYPE PHOTOSENSITIVE RESIN AND PREPARATION METHOD THEREFOR | Changzhou Tronly Advanced Electronic Materials Co., Ltd. (CN) | 2019-05-22 | — | — | EP | disclosed |