SCHEMBL21397096

SCHEMBL21397096

CCC1(COCC(O)COc2ccc(C3(c4ccc(OCC(O)COCC5(CC)COC5)cc4)c4ccccc4-c4ccccc43)cc2)COC1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 4/20 0.37
▸ POLB P06746 2/20 0.37
▸ KMT2A Q03164 3/20 0.35
▸ PKM P14618 1/20 0.33
▸ PDK2 Q15119 1/20 0.32
▸ MAPT P10636 4/20 0.32
▸ LMNA P02545 3/20 0.32
▸ KDM4E B2RXH2 2/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ MEN1 O00255 1/20 0.32
▸ OPRK1 P41145 1/20 0.32
▸ ALDH1A1 P00352 1/20 0.32
▸ RRM1 P23921 1/20 0.32
▸ GAA P10253 1/20 0.32
▸ CYP1A2 P05177 2/20 0.32
▸ HTT P42858 2/20 0.31
▸ MAPK1 P28482 1/20 0.31
▸ L3MBTL1 Q9Y468 1/20 0.31
▸ ESR1 P03372 1/20 0.31
▸ ESR2 Q92731 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14672829 0.84 KMT2A (0.40) SMN1; SMN2POLBKMT2APDK2MAPT
SCHEMBL1131082 0.84 LMNA (0.43) SMN1; SMN2POLBKMT2APKMMAPT
SCHEMBL21025659 0.81 CHRM5 (0.31) —
SCHEMBL21024930 0.80 ALDH1A1 (0.36) SMN1; SMN2NPSR1ALDH1A1
SCHEMBL23031896 0.78 CTSK (0.36) SMN1; SMN2MAPTLMNANPSR1ALDH1A1
SCHEMBL13929120 0.78 HIF1A (0.48) POLBKMT2AMAPTLMNAKDM4E
SCHEMBL14546243 0.78 MAPT (0.45) SMN1; SMN2POLBKMT2AMAPTLMNA
SCHEMBL21025829 0.78 — —
SCHEMBL21397094 0.77 CA1 (0.41) POLBPKMMAPTLMNANPSR1
SCHEMBL13599718 0.76 KMT2A (0.50) SMN1; SMN2POLBKMT2APDK2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11787959-B2 Radiation curable gravure ink CHANGZHOU GREEN PHOTOSENSITIVE MATERIALS CO., LTD. (CN) 2023-10-17 — — US disclosed
US-11787959-B2 Radiation curable gravure ink CHANGZHOU GREEN PHOTOSENSITIVE MATERIALS CO., LTD. (CN) 2023-10-17 — — US disclosed
US-20210115276-A1 Radiation curable Gravure Ink CHANGZHOU GREEN PHOTOSENSITIVE MAT CO LTD (CN) 2021-04-22 — — US disclosed
WO-2019179460-A1 RADIATION-CURABLE GRAVURE INK 常州格林感光新材料有限公司 2019-09-26 — — WO disclosed
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