Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 2/20 | 0.39 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.39 |
| ▸ | HTR1A | P08908 | 1/20 | 0.39 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.39 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.39 |
| ▸ | DRD1 | P21728 | 1/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.39 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.39 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.39 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.39 |
| ▸ | DRD3 | P35462 | 1/20 | 0.39 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2102030 | 0.89 | CHRM2 (0.35) | KCNH2CHRM2HTR1AADRA2ACHRM1 | |
| SCHEMBL2100019 | 0.80 | TP53 (0.36) | KCNH2CHRM2HTR1AADRA2ACHRM1 | |
| SCHEMBL9979418 | 0.80 | TP53 (0.36) | KCNH2CHRM2HTR1AADRA2ACHRM1 | |
| SCHEMBL2271289 | 0.80 | TP53 (0.36) | KCNH2CHRM2HTR1AADRA2ACHRM1 | |
| SCHEMBL2102653 | 0.78 | ESR1 (0.37) | KCNH2CHRM2HTR1AADRA2ACHRM1 | |
| SCHEMBL2272577 | 0.78 | ESR1 (0.37) | KCNH2CHRM2HTR1AADRA2ACHRM1 | |
| SCHEMBL10626373 | 0.78 | ESR1 (0.37) | KCNH2CHRM2HTR1AADRA2ACHRM1 | |
| SCHEMBL11313986 | 0.78 | TDP1 (0.43) | KCNH2CHRM2HTR1AADRA2ACHRM1 | |
| SCHEMBL2101348 | 0.76 | TP53 (0.33) | KCNH2CHRM2HTR1AADRA2ACHRM1 | |
| SCHEMBL2101242 | 0.76 | ALDH1A1 (0.33) | KCNH2CHRM2HTR1AADRA2ACHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119099177-A | Siloxane plasma polymers for sheet bonding | 康宁股份有限公司 | 2024-12-10 | — | — | CN | claimed |
| US-20210362470-A1 | SILOXANE PLASMA POLYMERS FOR SHEET BONDING | CORNING INC (US) | 2021-11-25 | — | — | US | claimed |
| US-20190176435-A1 | SILOXANE PLASMA POLYMERS FOR SHEET BONDING | CORNING INCORPORATED | 2019-06-13 | — | — | US | claimed |
| WO-2018044837-A1 | SILOXANE PLASMA POLYMERS FOR SHEET BONDING | CORNING INCORPORATED (US) | 2018-03-08 | — | — | WO | claimed |
| US-12384917-B1 | Physical characteristics of polysilylether polymers in additive manufacturing of energetic materials | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 2025-08-12 | — | — | US | disclosed |
| CN-119099177-A | Siloxane plasma polymers for sheet bonding | 康宁股份有限公司 | 2024-12-10 | — | — | CN | disclosed |
| US-12122138-B2 | Siloxane plasma polymers for sheet bonding | CORNING INCORPORATED (US) | 2024-10-22 | — | — | US | disclosed |
| US-11661483-B1 | Syntheses of polysilylether polymers in additive manufacturing of energetic materials | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 2023-05-30 | — | — | US | disclosed |
| US-20210362470-A1 | SILOXANE PLASMA POLYMERS FOR SHEET BONDING | CORNING INC (US) | 2021-11-25 | — | — | US | disclosed |
| US-20190176435-A1 | SILOXANE PLASMA POLYMERS FOR SHEET BONDING | CORNING INCORPORATED | 2019-06-13 | — | — | US | disclosed |
| WO-2018044837-A1 | SILOXANE PLASMA POLYMERS FOR SHEET BONDING | CORNING INCORPORATED (US) | 2018-03-08 | — | — | WO | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |