SCHEMBL2102658

SCHEMBL2102658

CCC[Si](Cl)(c1ccccc1)N(C)C

nearest known ligand 0.32

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
TSHR P16473 1/20 0.31
TP53 P04637 1/20 0.30
SIGMAR1 Q99720 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2100894 0.89 NPC1 (0.34) ALDH1A1TSHRSIGMAR1
SCHEMBL2104133 0.83 ALDH1A1 (0.33) ALDH1A1TSHRTP53
SCHEMBL2102665 0.82 NR1H2 (0.30) TSHR
SCHEMBL2102725 0.79 ALDH1A1 (0.33) ALDH1A1TSHRTP53SIGMAR1
SCHEMBL2272885 0.75 ALDH1A1 (0.33) ALDH1A1TSHRTP53SIGMAR1
SCHEMBL705990 0.74 TP53 (0.35) ALDH1A1TSHRTP53
SCHEMBL707143 0.74 TP53 (0.35) ALDH1A1TSHRTP53
SCHEMBL704073 0.74 TP53 (0.35) ALDH1A1TSHRTP53
SCHEMBL28218923 0.73 TP53 (0.38) ALDH1A1TSHRTP53SIGMAR1
SCHEMBL2101652 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed