⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21026957 | 0.95 | ALDH1A1 (0.31) | — | |
| SCHEMBL21026953 | 0.89 | ALDH1A1 (0.32) | — | |
| SCHEMBL825586 | 0.88 | ALDH1A1 (0.31) | — | |
| SCHEMBL10627034 | 0.80 | ALOX15 (0.34) | — | |
| SCHEMBL20382266 | 0.78 | ALDH1A1 (0.31) | — | |
| SCHEMBL6064769 | 0.78 | — | — | |
| SCHEMBL14519271 | 0.77 | ALDH1A1 (0.34) | — | |
| SCHEMBL10040357 | 0.77 | ALDH1A1 (0.30) | — | |
| SCHEMBL15082298 | 0.76 | HSD11B1 (0.30) | — | |
| SCHEMBL20382229 | 0.76 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11061329-B2 | Resist composition, method of forming resist pattern, polymeric compound, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-20190163057-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-05-30 | — | — | US | disclosed |