SCHEMBL21026953

SCHEMBL21026953

C=C(C)C(=O)OC1(C)CCC2CC21

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21026957 0.90 ALDH1A1 (0.31) ALDH1A1
SCHEMBL21026952 0.89
SCHEMBL825586 0.79 ALDH1A1 (0.31) ALDH1A1
SCHEMBL21026955 0.76 ALDH1A1 (0.32) ALDH1A1
SCHEMBL17829490 0.76 GABRP (0.32)
SCHEMBL21026956 0.76
SCHEMBL5918158 0.75 ALDH1A1 (0.37) ALDH1A1
SCHEMBL13376965 0.74 ALOX15 (0.35) ALDH1A1
SCHEMBL10040357 0.74 ALDH1A1 (0.30) ALDH1A1
SCHEMBL19881129 0.74 ALDH1A1 (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11061329-B2 Resist composition, method of forming resist pattern, polymeric compound, and compound TOKYO OHKA KOGYO CO., LTD. (JP) 2021-07-13 US disclosed
US-20190163057-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2019-05-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11061329-B2 Resist composition, method of forming resist pattern, polymeric compound, and compound RER1, ABCC1, CROCC ALDH1A1 735/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.