SCHEMBL2103985

SCHEMBL2103985

C=C[Si](Cl)(c1ccccc1)N(C)C

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2102541 0.79
SCHEMBL2276504 0.78 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL2100173 0.74 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL296774 0.71 ESR1 (0.37) ALDH1A1TSHR
SCHEMBL2100521 0.70 ESR1 (0.34) ALDH1A1TSHR
SCHEMBL388506 0.70 ALDH1A1 (0.38) ALDH1A1TSHR
SCHEMBL55438 0.70 ESR1 (0.34) ALDH1A1TSHR
SCHEMBL2104633 0.70 ESR1 (0.34) ALDH1A1TSHR
SCHEMBL296342 0.70 ALDH1A1 (0.38) ALDH1A1TSHR
SCHEMBL6936880 0.70 ALDH1A1 (0.38) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed