Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNN4 | O15554 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HTR2A | P28223 | 1/20 | 0.30 |
| ▸ | HRH1 | P35367 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14813091 | 0.78 | ACHE (0.39) | LMNATDP1 | |
| SCHEMBL2100400 | 0.77 | TAAR1 (0.42) | SIGMAR1HTR2AHRH1 | |
| SCHEMBL2102932 | 0.76 | KCNN4 (0.38) | KCNN4TP53SIGMAR1LMNATDP1 | |
| SCHEMBL2268660 | 0.76 | KCNN4 (0.38) | KCNN4TP53SIGMAR1LMNATDP1 | |
| SCHEMBL2274480 | 0.74 | KCNN4 (0.37) | KCNN4TP53SIGMAR1LMNATDP1 | |
| SCHEMBL2103258 | 0.74 | TAAR1 (0.39) | SIGMAR1HTR2AHRH1 | |
| SCHEMBL2101473 | 0.73 | TSHR (0.38) | KCNN4LMNATDP1 | |
| SCHEMBL2269967 | 0.73 | KCNN4 (0.35) | KCNN4TP53SIGMAR1LMNATDP1 | |
| SCHEMBL14797999 | 0.72 | HPGD (0.35) | LMNA | |
| SCHEMBL14813061 | 0.72 | TSHR (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8993072-B2 | Halogenated organoaminosilane precursors and methods for depositing films comprising same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-03-31 | — | — | US | claimed |
| EP-2574611-B1 | Halogenated Organoaminosilane Precursors and Methods for Depositing Films Comprising Same | AIR PROD & CHEM (US) | 2016-03-23 | — | — | EP | disclosed |
| EP-2574611-A1 | Halogenated Organoaminosilane Precursors and Methods for Depositing Films Comprising Same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-04-03 | — | — | EP | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |