SCHEMBL21060838

SCHEMBL21060838

O=C1CCCC(S(=O)(=O)c2ccccc2)C1=O

nearest known ligand 0.63

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.63
ALDH1A1 P00352 7/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
GAA P10253 2/20 0.40
HTR6 P50406 1/20 0.39
TSHR P16473 2/20 0.37
PARL Q9H300 2/20 0.37
ACHE P22303 1/20 0.37
HTR2A P28223 2/20 0.36
KDM4E B2RXH2 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
POLB P06746 1/20 0.35
HTR2C P28335 1/20 0.35
KCNH2 Q12809 1/20 0.35
CRBN Q96SW2 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21060841 0.83 ALDH1A1 (0.45) MAPTALDH1A1SMN1; SMN2HTR6TSHR
SCHEMBL21060836 0.80 PTGS2 (0.41) MAPTALDH1A1HTR2AMEN1KMT2A
SCHEMBL11369193 0.76 MAPT (0.97) MAPTALDH1A1SMN1; SMN2GAAHTR6
SCHEMBL316167 0.73 MAPT (0.51) MAPTHTR6ACHEHTR2AKDM4E
SCHEMBL2048495 0.71 HTR2A (0.59) MAPTALDH1A1SMN1; SMN2HTR6TSHR
SCHEMBL10879160 0.70 MAPT (0.59) MAPTALDH1A1SMN1; SMN2GAAKDM4E
SCHEMBL9770691 0.69 MAPT (0.50) MAPTALDH1A1SMN1; SMN2HTR6
SCHEMBL3387151 0.69 MAPT (0.50) MAPTALDH1A1SMN1; SMN2GAATSHR
SCHEMBL6216028 0.69 ALDH1A1 (0.57) MAPTALDH1A1SMN1; SMN2GAAACHE
SCHEMBL14312245 0.68 MAPT (0.49) MAPTALDH1A1SMN1; SMN2GAATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11884839-B2 Acetal-protected silanol group-containing polysiloxane composition NISSAN CHEMICAL CORPORATION (JP) 2024-01-30 US disclosed
CN-115885217-A Negative resist film laminate and pattern forming method 信越化学工业株式会社 2023-03-31 CN disclosed
CN-109563371-B Polysiloxane composition comprising acetal-protected silanol groups 日产化学株式会社 2021-09-21 CN disclosed
CN-105404096-B Chemically amplified positive resist dry film, dry film laminate and method for producing laminate 信越化学工业株式会社 2021-07-16 CN disclosed
US-20190185707-A1 ACETAL-PROTECTED SILANOL GROUP-CONTAINING POLYSILOXANE COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2019-06-20 US disclosed