⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL404488 | 0.94 | — | — | |
| SCHEMBL220313 | 0.94 | — | — | |
| SCHEMBL407670 | 0.89 | — | — | |
| SCHEMBL87723 | 0.88 | — | — | |
| SCHEMBL42699 | 0.88 | — | — | |
| SCHEMBL2003291 | 0.82 | — | — | |
| SCHEMBL5668574 | 0.82 | — | — | |
| SCHEMBL4018138 | 0.82 | — | — | |
| SCHEMBL356290 | 0.82 | — | — | |
| SCHEMBL4344882 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9698241-B1 | Integrated circuits with replacement metal gates and methods for fabricating the same | GlobalFoundries, Inc. (KY) | 2017-07-04 | — | — | US | disclosed |
| US-20160351675-A1 | INTEGRATED CIRCUITS AND METHODS FOR FABRICATING INTEGRATED CIRCUITS HAVING REPLACEMENT METAL GATE ELECTRODES | GLOBALFOUNDRIES U.S. INC. | 2016-12-01 | — | — | US | disclosed |
| US-8236475-B2 | Methods for removing a photoresist from a metal-comprising material | ADVANCED MICRO DEVICES, INC. (US) | 2012-08-07 | — | — | US | disclosed |
| US-8158530-B2 | Methods for retaining metal-comprising materials using liquid chemistry dispense systems from which oxygen has been removed | GLOBALFOUNDRIES INC. (KY) | 2012-04-17 | — | — | US | disclosed |
| US-7790624-B2 | Methods for removing a metal-comprising material from a semiconductor substrate | Global Foundries Inc. (KY) | 2010-09-07 | — | — | US | disclosed |
| US-20100062609-A1 | METHODS FOR RETAINING METAL-COMPRISING MATERIALS USING LIQUID CHEMISTRY DISPENSE SYSTEMS FROM WHICH OXYGEN HAS BEEN REMOVED | ADVANCED MICRO DEVICES, INC. (US) | 2010-03-11 | — | — | US | disclosed |
| US-20100015804-A1 | METHODS FOR REMOVING A METAL-COMPRISING MATERIAL FROM A SEMICONDUCTOR SUBSTRATE | ADVANCED MICRO DEVICES, INC. (US) | 2010-01-21 | — | — | US | disclosed |
| US-20090286385-A1 | METHODS FOR REMOVING A PHOTORESIST FROM A METAL-COMPRISING MATERIAL | ADVANCED MICRO DEVICES, INC. (US) | 2009-11-19 | — | — | US | disclosed |