⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28052065 | 0.82 | GPR84 (0.35) | — | |
| SCHEMBL211364 | 0.81 | ALDH1A1 (0.41) | — | |
| SCHEMBL22129515 | 0.79 | GPR84 (0.41) | — | |
| SCHEMBL202165 | 0.75 | SLC22A6 (0.39) | — | |
| SCHEMBL210088 | 0.75 | — | — | |
| SCHEMBL22906066 | 0.73 | — | — | |
| SCHEMBL156206 | 0.73 | — | — | |
| SCHEMBL5454693 | 0.73 | TSHR (0.39) | — | |
| SCHEMBL27438161 | 0.73 | MEN1 (0.38) | — | |
| SCHEMBL2185057 | 0.71 | PPARA (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 237 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020209223-A1 | POWDER DISPERSION, PRODUCTION METHOD FOR POWDER DISPERSION, AND PRODUCTION METHOD FOR RESIN-INCLUDING SUBSTRATE | ＡＧＣ株式会社 | 2020-10-15 | — | — | WO | claimed |
| US-12025919-B2 | Method of storing photoresist coated substrates and semiconductor substrate container arrangement | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2024-07-02 | — | — | US | disclosed |
| US-11977333-B2 | Semiconductor devices and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-05-07 | — | — | US | disclosed |
| US-11971657-B2 | Photoresist developer and method of developing photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-04-30 | — | — | US | disclosed |
| US-20240118618-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-04-11 | — | — | US | disclosed |
| US-20240096623-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-21 | — | — | US | disclosed |
| US-20240079235-A1 | SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2024-03-07 | — | — | US | disclosed |
| US-11842896-B2 | Semiconductor devices and methods of manufacturing | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-12-12 | — | — | US | disclosed |
| US-20230393474-A1 | PHOTORESIST UNDERLAYER AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-12-07 | — | — | US | disclosed |
| US-20230393475-A1 | METALLIC PHOTORESIST PATTERNING AND DEFECT IMPROVEMENT | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2023-12-07 | — | — | US | disclosed |
| CN-101247938-A | Method for producing cellulose acylate film, polarizing plate and liquid crystal display | FUJIFILM CORP (JP) | 2008-08-20 | — | — | CN | disclosed |
| CN-101163464-A | Polymeric implants, preferably containing a mixture of PEG and PLG, for controlled release of a GnRH | DOURETKORT COMPANY (US) | 2008-04-16 | — | — | CN | disclosed |
| US-20070172769-A1 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070172768-A1 | Pattern forming method | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| EP-1811339-A1 | Pattern forming method | Fujifilm Corporation (JP) | 2007-07-25 | — | — | EP | disclosed |
| EP-1811338-A2 | Pattern forming method | Fujifilm Corporation (JP) | 2007-07-25 | — | — | EP | disclosed |
| CN-1946778-A | Cellulose acylate film, polarizing plate and liquid crystal display | FUJI PHOTO FILM CO LTD (JP) | 2007-04-11 | — | — | CN | disclosed |
| CN-1222826-C | Silver halide colour photographic light-sensitive material | FUJI PHOTO FILM CO LTD (JP) | 2005-10-12 | — | — | CN | disclosed |
| CN-1340740-A | Silver halide colour photographic light-sensitive material | FUJI PHOTO FILM CO LTD (JP) | 2002-03-20 | — | — | CN | disclosed |
| CN-1057343-A | SILVER HALIDE COLOR PHOTOGRAPHIC MATERIALS | FUJI PHOTO FILM CO LTD (JP) | 1991-12-25 | — | — | CN | disclosed |