Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADH1B | P00325 | 5/20 | 1.00 |
| ▸ | ADH1A | P07327 | 5/20 | 1.00 |
| ▸ | ADH1C | P00326 | 4/20 | 1.00 |
| ▸ | ADH4 | P08319 | 2/20 | 1.00 |
| ▸ | ADH7 | P40394 | 3/20 | 0.94 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.53 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | EPHX1 | P07099 | 6/20 | 0.42 |
| ▸ | NPC1 | O15118 | 2/20 | 0.42 |
| ▸ | RAB9A | P51151 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA7 | P43166 | 1/20 | 0.42 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9206597 | 1.00 | ADH1B (1.00) | ADH1BADH1AADH1CADH4ADH7 | |
| SCHEMBL645299 | 1.00 | ADH1B (1.00) | ADH1BADH1AADH1CADH4ADH7 | |
| SCHEMBL2109469 | 1.00 | ADH1B (1.00) | ADH1BADH1AADH1CADH4ADH7 | |
| SCHEMBL245391 | 1.00 | ADH1B (1.00) | ADH1BADH1AADH1CADH4ADH7 | |
| Cyclohexylformamide SCHEMBL28496813 | 1.00 | ADH1B (1.00) | ADH1BADH1AADH1CADH4ADH7 | |
| SCHEMBL22988657 | 1.00 | ADH1B (1.00) | ADH1BADH1AADH1CADH4ADH7 | |
| Cyclohexylformamide SCHEMBL26146 | 1.00 | — | — | |
| Cyclohexylformamide SCHEMBL817895 | 0.97 | ADH1B (0.94) | ADH1BADH1AADH1CADH4ADH7 | |
| Cyclohexylformamide SCHEMBL816897 | 0.97 | ADH1B (0.94) | ADH1BADH1AADH1CADH4ADH7 | |
| Cyclohexylformamide SCHEMBL815680 | 0.97 | ADH1B (0.94) | ADH1BADH1AADH1CADH4ADH7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109709770-B | Resin composition, dry film and method for producing same, method for producing resist film and substrate, method for producing plated molded article, and mercapto compound | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| WO-2021188696-A1 | STAT DEGRADERS AND USES THEREOF | KYMERA THERAPEUTICS, INC. (US) | 2021-09-23 | — | — | WO | disclosed |
| US-11061326-B2 | Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-07-13 | — | — | US | disclosed |
| US-11022880-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| EP-2478981-B1 | SILVER-(CONJUGATED COMPOUND) COMPLEX | SUMITOMO CHEMICAL CO (JP) | 2020-12-23 | — | — | EP | disclosed |
| US-20200209739-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-07-02 | — | — | US | disclosed |
| US-20190121233-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-25 | — | — | US | disclosed |
| US-20190101825-A1 | CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PHOTOSENSITIVE DRY FILM, A METHOD FOR PRODUCING A PATTERNED RESIST FILM, A METHOD OF MANUFACTURING A TEMPLATE WITH A SUBSTRATE, AND A METHOD OF MANUFACTURING A PLATED SHAPED PRODUCT, AND A MERCAPTO COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-04 | — | — | US | disclosed |
| US-20180259853-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD FOR MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-09-13 | — | — | US | disclosed |
| US-9704612-B2 | Composition of silver-conjugated compound composite | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-07-11 | — | — | US | disclosed |
| US-9412487-B2 | Silver-(conjugated compound) composite | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-09 | — | — | US | disclosed |
| EP-1903069-B1 | NOVEL POLYMER AND METHOD OF MEASURING CHOLESTEROL THEREWITH | WAKO PURE CHEM IND LTD (JP) | 2015-08-12 | — | — | EP | disclosed |
| US-20140001422-A1 | COMPOSITION OF SILVER-CONJUGATED COMPOUND COMPOSITE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-01-02 | — | — | US | disclosed |
| EP-2478981-A1 | SILVER-(CONJUGATED COMPOUND) COMPLEX | Sumitomo Chemical Co., Ltd (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-20120168693-A1 | SILVER-(CONJUGATED COMPOUND) COMPOSITE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-05 | — | — | US | disclosed |
| US-8158375-B2 | Polymer and method of measuring cholesterol therewith | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| EP-2239281-A2 | Novel polymer and method for determining cholesterol using the same | Wako Pure Chemical Industries, Ltd. (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20090215097-A1 | Novel Polymer and Method of Measuring Cholesterol Therewith | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2009-08-27 | — | — | US | disclosed |
| EP-1903069-A1 | NOVEL POLYMER AND METHOD OF MEASURING CHOLESTEROL THEREWITH | Wako Pure Chemical Industries, Ltd. (JP) | 2008-03-26 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20190121233-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND | CUTA, POLR1C, ASIC1 | ADH1B 2352/4885ADH1A 1502/4885ADH1C 3321/4885 |
| US-20200209739-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND | CUTA, RAD51, PCNA | ADH1B 2564/4885ADH1A 949/4885ADH1C 3218/4885 |
| US-11022880-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound | CUTA, POLR1C, ASIC1 | ADH1B 2352/4885ADH1A 1502/4885ADH1C 3321/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.