SCHEMBL21135974

SCHEMBL21135974

COC(=O)C(F)(CC1CCCCC1)S(=O)(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 2/20 0.40
MMP9 P14780 1/20 0.40
MMP13 P45452 1/20 0.40
ADAM17 P78536 1/20 0.40
HDAC6 Q9UBN7 3/20 0.35
ALDH1A1 P00352 1/20 0.35
MLYCD O95822 1/20 0.35
EPHX2 P34913 2/20 0.34
HPGD P15428 1/20 0.33
KMT2A Q03164 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
CNR1 P21554 1/20 0.33
CNR2 P34972 1/20 0.33
HDAC3 O15379 1/20 0.33
HDAC4 P56524 1/20 0.33
HDAC1 Q13547 1/20 0.33
MMP3 P08254 2/20 0.33
MMP2 P08253 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21135762 0.86 ALDH1A1 (0.36) MMP1MMP9MMP13ADAM17ALDH1A1
SCHEMBL21135765 0.85 CTSL (0.33) MMP1MMP9MMP13ADAM17HDAC6
SCHEMBL21135920 0.84 EPHX1 (0.35) MMP1MMP9MMP13ADAM17HDAC6
SCHEMBL21135976 0.83 HDAC6 (0.34) MMP1MMP9MMP13ADAM17HDAC6
SCHEMBL21135980 0.82 HDAC6 (0.33) MMP1MMP9MMP13ADAM17HDAC6
SCHEMBL21135757 0.79 MMP1 (0.33) MMP1MMP9MMP13ADAM17HDAC6
SCHEMBL21135740 0.79 HDAC6 (0.32) MMP1MMP9MMP13ADAM17HDAC6
SCHEMBL21135984 0.79 EPHX1 (0.36) MMP1MMP9MMP13ADAM17HDAC6
SCHEMBL10681272 0.74 MMP1 (0.41) MMP1MMP9MMP13ADAM17ALDH1A1
SCHEMBL21135704 0.74 MMP1 (0.35) MMP1MMP9MMP13ADAM17HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190196326-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-06-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190196326-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE RER1, ACTR5, RAD51 MMP1 3169/4885MMP9 1850/4885MMP13 2513/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.