SCHEMBL21136396

SCHEMBL21136396

CCC(F)(C(=O)C1CCCCC1)S(=O)(=O)O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.36
TSHR P16473 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
CES2 O00748 1/20 0.34
CES1 P23141 1/20 0.34
HSD11B1 P28845 1/20 0.33
GAA P10253 1/20 0.33
RECQL P46063 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
HSD17B10 Q99714 1/20 0.33
ENPP3 O14638 2/20 0.32
ENPP1 P22413 2/20 0.32
ENPP2 Q13822 2/20 0.32
ALDH1A1 P00352 2/20 0.32
KMT2A Q03164 1/20 0.31
HDAC8 Q9BY41 1/20 0.31
HDAC6 Q9UBN7 1/20 0.31
PDK1 Q15118 1/20 0.30
PDK2 Q15119 1/20 0.30
PDK3 Q15120 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21136388 0.87 NAAA (0.37) NAAATSHRL3MBTL1CES2CES1
SCHEMBL21136390 0.83 CES2 (0.32) NAAATSHRL3MBTL1CES2CES1
SCHEMBL21135984 0.81 EPHX1 (0.36) CES2CES1HDAC6
SCHEMBL21136394 0.80 EPHX2 (0.38) NAAATSHRL3MBTL1SMN1; SMN2HSD17B10
SCHEMBL21136395 0.80 EPHX2 (0.33) SMN1; SMN2ALDH1A1KMT2A
SCHEMBL21135924 0.76 EPHX1 (0.42) NAAASMN1; SMN2
SCHEMBL21136595 0.74 ALDH1A1 (0.38) TSHRHSD11B1GAASMN1; SMN2ALDH1A1
SCHEMBL12919719 0.74 ALDH1A1 (0.44) TSHRL3MBTL1CES2CES1SMN1; SMN2
SCHEMBL21136384 0.72 CES2 (0.34) TSHRCES2CES1RECQLALDH1A1
SCHEMBL21136389 0.71 CES2 (0.37) NAAATSHRL3MBTL1CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190196326-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-06-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190196326-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE RER1, ACTR5, RAD51 NAAA 1615/4885TSHR 1775/4885L3MBTL1 4400/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.