Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CSNK2A1 | P68400 | 1/20 | 0.43 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.42 |
| ▸ | TP53 | P04637 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 5/20 | 0.40 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.40 |
| ▸ | ADRA1A | P35348 | 2/20 | 0.40 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.40 |
| ▸ | HTR2B | P41595 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 5/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 4/20 | 0.37 |
| ▸ | MEN1 | O00255 | 3/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL10438029 | 0.97 | CSNK2A1 (0.44) | CSNK2A1TRPA1TP53TDP1LMNA | |
| SCHEMBL10438126 | 0.82 | CHRM1 (0.38) | CSNK2A1TRPA1TP53TDP1LMNA | |
| SCHEMBL10438024 | 0.81 | ALDH1A1 (0.46) | LMNAGAAHTTALDH1A1 | |
| SCHEMBL21564954 | 0.77 | MAPT (0.39) | TRPA1TDP1LMNACHRM1ADRA1A | |
| SCHEMBL28276798 | 0.77 | TRPA1 (0.48) | CSNK2A1TRPA1TP53TDP1LMNA | |
| SCHEMBL10079669 | 0.76 | GAA (0.48) | TP53LMNAGAAKMT2AHPGD | |
| SCHEMBL15429257 | 0.76 | CSNK2A1 (0.47) | CSNK2A1TRPA1TP53TDP1LMNA | |
| SCHEMBL544302 | 0.76 | GABRA1 (0.48) | TP53LMNAGAAKMT2AHTT | |
| SCHEMBL28072644 | 0.73 | CHRM1 (0.39) | CSNK2A1TRPA1TP53TDP1LMNA | |
| SCHEMBL9685971 | 0.72 | CYP1A2 (0.46) | TDP1LMNAGAAKMT2AHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 374 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117806123-A | Chemical amplification type negative photosensitive polyimide composition and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-115561966-B | Chemical amplification type negative photosensitive polyimide coating adhesive and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-16 | — | — | CN | claimed |
| CN-115561966-A | Chemical amplification type negative photosensitive polyimide coating adhesive and application | 明士(北京)新材料开发有限公司 | 2023-01-03 | — | — | CN | claimed |
| CN-114874441-A | Chemical amplification type positive photosensitive polyimide coating adhesive and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-08-09 | — | — | CN | claimed |
| CN-114488690-A | Chemical amplification type negative polyimide photoresist and preparation method and application thereof | 中国科学院化学研究所 | 2022-05-13 | — | — | CN | claimed |
| CN-111522200-B | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2021-07-27 | — | — | CN | claimed |
| CN-111522200-A | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2020-08-11 | — | — | CN | claimed |
| EP-0543762-B1 | Dry developable photoresist compositions and method for use thereof | IBM (US) | 2000-02-16 | — | — | EP | claimed |
| US-5322765-A | Dry developable photoresist compositions and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-06-21 | — | — | US | claimed |
| US-5296332-A | Crosslinkable aqueous developable photoresist compositions and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-03-22 | — | — | US | claimed |
| EP-0543761-A1 | Crosslinkable aqueous developable photoresist compositions and method for use thereof | International Business Machines Corporation (US) | 1993-05-26 | — | — | EP | claimed |
| EP-3893054-B1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-20250382492-A1 | LAMINATE, METHOD FOR MANUFACTURING LAMINATE, HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT | TORAY INDUSTRIES, INC. (JP) | 2025-12-18 | — | — | US | disclosed |
| US-12473403-B2 | Curable resin composition, cured film, laminate, method for manufacturing cured film, semiconductor device, and polymer precursor | FUJIFILM CORPORATION (JP) | 2025-11-18 | — | — | US | disclosed |
| US-12405531-B2 | Organic EL display device, production method for cured product, and production method for organic EL display device | TORAY INDUSTRIES, INC. (JP) | 2025-09-02 | — | — | US | disclosed |
| EP-0543762-B1 | Dry developable photoresist compositions and method for use thereof | IBM (US) | 2000-02-16 | — | — | EP | disclosed |
| US-5322765-A | Dry developable photoresist compositions and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-06-21 | — | — | US | disclosed |
| US-5296332-A | Crosslinkable aqueous developable photoresist compositions and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-03-22 | — | — | US | disclosed |
| EP-0543762-A1 | Dry developable photoresist compositions and method for use thereof | International Business Machines Corporation (US) | 1993-05-26 | — | — | EP | disclosed |
| EP-0543761-A1 | Crosslinkable aqueous developable photoresist compositions and method for use thereof | International Business Machines Corporation (US) | 1993-05-26 | — | — | EP | disclosed |