Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3415846 | 0.85 | ALDH1A1 (0.33) | HSD11B1ALDH1A1TSHR | |
| SCHEMBL12002690 | 0.85 | ALDH1A1 (0.33) | HSD11B1ALDH1A1TSHR | |
| SCHEMBL1820168 | 0.82 | HSD11B1 (0.37) | HSD11B1ALDH1A1TSHR | |
| SCHEMBL27914734 | 0.79 | HSD11B1 (0.35) | HSD11B1ALDH1A1TSHR | |
| SCHEMBL85908 | 0.77 | — | — | |
| SCHEMBL5001409 | 0.76 | TSHR (0.35) | ALDH1A1TSHR | |
| SCHEMBL15836492 | 0.76 | — | — | |
| SCHEMBL27777230 | 0.75 | ALDH1A1 (0.36) | ALDH1A1TSHR | |
| SCHEMBL74914 | 0.74 | HSD11B1 (0.31) | HSD11B1 | |
| Adamantane SCHEMBL12803307 | 0.73 | TSHR (0.41) | HSD11B1ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9598520-B2 | Radiation-sensitive resin composition, polymer and method for forming a resist pattern | JSR CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-8815490-B2 | Radiation-sensitive resin composition, polymer, and method for forming resist pattern | JSR CORPORATION (JP) | 2014-08-26 | — | — | US | disclosed |
| US-20120295197-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMING A RESIST PATTERN | JSR CORPORATION (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120094234-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |