Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27914734 | 0.82 | HSD11B1 (0.35) | HSD11B1TSHRALDH1A1EPHX2 | |
| SCHEMBL2117228 | 0.82 | HSD11B1 (0.35) | HSD11B1TSHRALDH1A1 | |
| SCHEMBL3455021 | 0.80 | HSD11B1 (0.33) | HSD11B1TSHRALDH1A1 | |
| Adamantane SCHEMBL12803307 | 0.79 | TSHR (0.41) | HSD11B1TSHRALDH1A1EPHX2 | |
| SCHEMBL5097823 | 0.78 | HSD11B1 (0.37) | HSD11B1TSHREPHX2 | |
| SCHEMBL2167749 | 0.78 | HSD11B1 (0.37) | HSD11B1EPHX2 | |
| SCHEMBL2168091 | 0.78 | HSD11B1 (0.37) | HSD11B1EPHX2 | |
| SCHEMBL3454653 | 0.77 | HSD11B1 (0.32) | HSD11B1TSHR | |
| SCHEMBL74914 | 0.76 | HSD11B1 (0.31) | HSD11B1 | |
| SCHEMBL463743 | 0.76 | CTSK (0.36) | TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117945957-A | Photoacid generating compounds and related polymers, photoresist compositions, and methods of forming photoresist relief images | 罗门哈斯电子材料有限责任公司 | 2024-04-30 | — | — | CN | disclosed |
| EP-2554555-B1 | METHODS FOR PRODUCING AN ADAMANTYL (METH)ACRYLATE MONOMER AND A (METH)ACRYLIC COPOLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-09-18 | — | — | EP | disclosed |
| CN-105980347-B | Method for producing novel alicyclic ester compound, (meth) acrylic copolymer obtained by polymerizing the same, and photosensitive resin composition containing the same | 三菱瓦斯化学株式会社 | 2019-08-16 | — | — | CN | disclosed |
| EP-3106477-B1 | (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-08-29 | — | — | EP | disclosed |
| US-10005714-B2 | (Meth)acrylic acid ester compound and production method therefor | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-06-26 | — | — | US | disclosed |
| US-9994513-B2 | Method for producing novel ali cyclic ester compound, novel alicyclic ester compound, (meth)acrylic copolymer produced by polymerizing said compound, and photosensitive resin composition using said copolymer | MITSUBISHI GAS CHEMICAL, INC. (JP) | 2018-06-12 | — | — | US | disclosed |
| EP-2990425-B1 | NOVEL ALICYCLIC ESTER COMPOUND, AND (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-9951163-B2 | (Meth)acrylate compound, (meth)acrylic copolymer and photosensitive resin composition containing same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-04-24 | — | — | US | disclosed |
| EP-1267210-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2018-02-21 | — | — | EP | disclosed |
| US-20170008830-A1 | (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-01-12 | — | — | US | disclosed |
| US-20030108809-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-06-12 | — | — | US | disclosed |
| US-20030077543-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2003-04-24 | — | — | US | disclosed |
| US-20030077540-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-04-24 | — | — | US | disclosed |
| US-6541597-B2 | Resist resin having in its structure a bridged bond containing aliphatic ring; pattern excellent in transparency against short wavelength light and dry-etching resistance can be formed by alkali development with high resolution. | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20030017415-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2003-01-23 | — | — | US | disclosed |
| EP-1267210-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-12-18 | — | — | EP | disclosed |
| EP-1260864-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-27 | — | — | EP | disclosed |
| US-20020098441-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-25 | — | — | US | disclosed |
| US-20020052449-A1 | Method of quantifying protective ratio of hydroxyl groups of polymer compound | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-05-02 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10005714-B2 | (Meth)acrylic acid ester compound and production method therefor | AMD1, ALDH7A1, TMEM164 | HSD11B1 517/4885TSHR 3202/4885ALDH1A1 118/4885 |
| US-20170008830-A1 | (METH)ACRYLIC ACID ESTER COMPOUND AND PRODUCTION METHOD THEREFOR | AMD1, ALDH7A1, TMEM164 | HSD11B1 653/4885TSHR 3165/4885ALDH1A1 156/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.