Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23520529 | 0.98 | THRB (0.33) | ALDH1A1THRBTSHRADORA3 | |
| SCHEMBL390238 | 0.98 | THRB (0.33) | ALDH1A1THRBTSHRADORA3 | |
| SCHEMBL23352251 | 0.86 | ALDH1A1 (0.33) | ALDH1A1THRBTSHRADORA3 | |
| SCHEMBL23563321 | 0.85 | THRB (0.31) | ALDH1A1THRBTSHR | |
| SCHEMBL21911838 | 0.85 | THRB (0.33) | ALDH1A1THRBTSHRADORA3 | |
| SCHEMBL21911839 | 0.84 | ALDH1A1 (0.34) | ALDH1A1THRBTSHR | |
| SCHEMBL21143300 | 0.83 | ALDH1A1 (0.35) | ALDH1A1TSHR | |
| SCHEMBL354732 | 0.83 | ALDH1A1 (0.33) | ALDH1A1THRBTSHRADORA3 | |
| SCHEMBL1471662 | 0.82 | ADORA3 (0.34) | ADORA3 | |
| SCHEMBL17300334 | 0.82 | ALDH1A1 (0.38) | ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20210364920-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-11-25 | — | — | US | disclosed |
| US-20210141309-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-13 | — | — | US | disclosed |
| US-20190219920-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COPOLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-18 | — | — | US | disclosed |