SCHEMBL2117384

SCHEMBL2117384

Cc1[c]ccc2cc3ccccc3cc12

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.38
HSD17B10 Q99714 3/20 0.38
HIF1A Q16665 1/20 0.38
CYP1B1 Q16678 1/20 0.38
CYP1A2 P05177 5/20 0.38
CYP2A6 P11509 4/20 0.38
NQO1 P15559 1/20 0.38
HPGD P15428 3/20 0.37
TDP1 Q9NUW8 1/20 0.37
KDM4E B2RXH2 5/20 0.36
GAA P10253 4/20 0.36
MAPT P10636 3/20 0.35
SMN1; SMN2 Q16637 2/20 0.33
GLA P06280 2/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
HTR2A P28223 1/20 0.33
ELANE P08246 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
NPC1 O15118 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1557072 0.98 ALDH1A1 (0.37) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL219753 0.80 CYP2A6 (0.46) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL5745901 0.76 CYP1A2 (0.39) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL2253523 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL1941944 0.75 ALDH1A1 (0.40) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL2254837 0.75 ALDH1A1 (0.34) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL2253950 0.75 NQO1 (0.47) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL1535589 0.72 CYP1A2 (0.47) ALDH1A1HSD17B10CYP1A2CYP2A6HPGD
SCHEMBL4344677 0.72 ALOX5 (0.42) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2
SCHEMBL1557069 0.72 CYP1A2 (0.39) ALDH1A1HSD17B10HIF1ACYP1B1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3064997-B1 LAMINATE AND USE OF A KIT FOR MANUFACTURING OF A LAMINATE FUJIFILM CORP (JP) 2021-04-28 EP disclosed
US-10833272-B2 Laminate and kit FUJIFILM CORPORATION (JP) 2020-11-10 US disclosed
CN-105683835-B Laminated body, organic semiconductor manufacture are manufactured with set group and organic semiconductor uses light resistance composition 富士胶片株式会社 2019-11-26 CN disclosed
US-10439139-B2 2019-10-08 US disclosed
CN-105474099-B Laminated body 富士胶片株式会社 2019-09-03 CN disclosed
CN-103091986-B Positive-type photosensitive resin composition, cured film and forming method thereof, liquid crystal display device and organic electroluminescence display device and method of manufacturing same 富士胶片株式会社 2018-05-18 CN disclosed
CN-102955361-B Positive-type photosensitive resin composition, the forming method of cured film, cured film, liquid crystal display device and organic EL display 富士胶片株式会社 2018-04-06 CN disclosed
US-9929376-B2 Laminate, kit for manufacturing organic semiconductor, and resist composition for manufacturing organic semiconductor FUJIFILM CORPORATION (JP) 2018-03-27 US disclosed
US-20180040824-A1 LAMINATE AND KIT FUJIFILM CORPORATION (JP) 2018-02-08 US disclosed
EP-2818462-B1 CYCLIC AZINE DERIVATIVES, PROCESSES FOR PRODUCING THESE, AND ORGANIC ELECTROLUMISCENT ELEMENT CONTAINING THESE AS COMPONENT TOSOH CORP (JP) 2017-11-08 EP disclosed
EP-2468731-A1 CYCLIC AZINE DERIVATIVES, PROCESSES FOR PRODUCING THESE, AND ORGANIC ELECTROLUMINESCENT ELEMENT CONTAINING THESE AS COMPONENT Tosoh Corporation (JP) 2012-06-27 EP disclosed
US-20120107563-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS FUJIFILM CORPORATION (JP) 2012-05-03 US disclosed
EP-2447773-A1 Photosensitive resin composition, method for producing pattern, MEMS structure, method for producing the structure, method for dry etching, method for wet etching, MEMS shutter device, and image display apparatus Fujifilm Corporation (JP) 2012-05-02 EP disclosed
US-8158787-B2 Process for producing trichloropyrimidine compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-04-17 US disclosed
CN-102193316-A Positive photosensitive resin composition, formation method of curing film, curing film, organic el display device and liquid crystal display device FUJI PHOTO FILM CO LTD 2011-09-21 CN disclosed
US-20100160630-A1 PROCESS FOR PRODUCING TRICHLOROPYRIMIDINE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-24 US disclosed
CN-101646657-A Process for producing trichloropyrimidine compound SUMITOMO CHEMICAL CO JP 2010-02-10 CN disclosed
EP-2128141-A1 PROCESS FOR PRODUCING TRICHLOROPYRIMIDINE COMPOUND Sumitomo Chemical Company, Limited (JP) 2009-12-02 EP disclosed
US-20060293503-A1 Polyaminopyridines and method for producing same SUMITOMO SEIKA CHEMICALS CO., LTD (JP) 2006-12-28 US disclosed
EP-1669390-A1 POLYAMINOPYRIDINES AND METHOD FOR PRODUCING SAME SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2006-06-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100160630-A1 PROCESS FOR PRODUCING TRICHLOROPYRIMIDINE COMPOUND DPYD, TYMP, TST ALDH1A1 2454/4885HSD17B10 1580/4885HIF1A 2900/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.