Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DRD1 | P21728 | 1/20 | 0.39 |
| ▸ | MMP2 | P08253 | 1/20 | 0.35 |
| ▸ | MMP9 | P14780 | 1/20 | 0.35 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | CFTR | P13569 | 1/20 | 0.30 |
| ▸ | GOPC | Q9HD26 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22991418 | 0.81 | LMNA (0.35) | DRD1CFTRGOPC | |
| SCHEMBL22991356 | 0.81 | MMP2 (0.34) | DRD1MMP2MMP9 | |
| SCHEMBL22991302 | 0.79 | DRD1 (0.49) | DRD1 | |
| SCHEMBL23861414 | 0.79 | DRD1 (0.39) | DRD1MMP2MMP9 | |
| SCHEMBL22991426 | 0.75 | MMP2 (0.35) | MMP2MMP9SIGMAR1 | |
| SCHEMBL27455250 | 0.74 | MMP2 (0.34) | MMP2MMP9ATMCFTRGOPC | |
| SCHEMBL15713397 | 0.71 | MMP2 (0.41) | DRD1MMP2MMP9CFTRGOPC | |
| SCHEMBL23861538 | 0.70 | OPRD1 (0.36) | DRD1MMP2MMP9ATM | |
| SCHEMBL23861412 | 0.70 | GNG2 (0.48) | DRD1MMP2MMP9 | |
| SCHEMBL23861477 | 0.69 | IDO1 (0.35) | DRD1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210047457-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-18 | — | — | US | disclosed |
| EP-3744710-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-02 | — | — | EP | disclosed |
| WO-2019142897-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | 三菱瓦斯化学株式会社 | 2019-07-25 | — | — | WO | disclosed |