SCHEMBL21189420

SCHEMBL21189420

CC(c1ccc(C2CCCCC2)cc1)(c1ccc(S)cc1S)c1ccc(S)cc1S

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.38
CYP2C9 P11712 1/20 0.38
CNR2 P34972 6/20 0.33
LMNA P02545 3/20 0.33
HTT P42858 2/20 0.33
HTR2C P28335 2/20 0.33
ACE P12821 1/20 0.33
KDM1A O60341 1/20 0.33
MAPT P10636 3/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
XBP1 P17861 1/20 0.33
ALDH1A1 P00352 1/20 0.33
TP53 P04637 1/20 0.33
ATM Q13315 1/20 0.33
HSP90AA1 P07900 1/20 0.33
GAA P10253 1/20 0.33
KMT2A Q03164 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC8 Q9BY41 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189421 0.83 CYP3A4 (0.41) CYP3A4CYP2C9CNR2LMNAHTT
SCHEMBL22991406 0.83 KIF11 (0.33) KIF11
SCHEMBL21189414 0.82 KIF11 (0.40) CYP3A4CYP2C9CNR2LMNAHTT
SCHEMBL21189676 0.81 CYP3A4 (0.40) CYP3A4CYP2C9CNR2LMNAHTT
SCHEMBL21189663 0.81 ESR1 (0.30)
SCHEMBL22737896 0.79 CYP3A4 (0.33) CYP3A4CYP2C9
SCHEMBL22737898 0.77 CYP3A4 (0.38) CYP3A4CYP2C9LMNAHTTMAPT
SCHEMBL21189702 0.73
SCHEMBL22738142 0.73 PDE2A (0.35)
SCHEMBL21189657 0.73 ESR1 (0.39) CYP3A4MAPTALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed