SCHEMBL21189637

SCHEMBL21189637

CC(c1ccc(-c2ccc(C(C)(c3cc(-c4ccc(S)cc4)ccc3S)c3cc(-c4ccc(S)cc4)ccc3S)cc2)cc1)(c1cc(-c2ccc(S)cc2)ccc1S)c1cc(-c2ccc(S)cc2)ccc1S

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.31
AR P10275 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189812 1.00 KIF11 (0.31) KIF11AR
SCHEMBL21189631 0.93 KIF11 (0.40) KIF11
SCHEMBL22738049 0.92
SCHEMBL21189809 0.91 ESR1 (0.35) KIF11
SCHEMBL22991378 0.91 KIF11 (0.31) KIF11
SCHEMBL22737576 0.88 AR (0.36) AR
SCHEMBL21189678 0.85 ESR1 (0.37)
SCHEMBL21189676 0.83 CYP3A4 (0.40)
SCHEMBL21189647 0.82
SCHEMBL21189814 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed