Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 2/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.35 |
| ▸ | RXRA | P19793 | 1/20 | 0.34 |
| ▸ | RXRB | P28702 | 1/20 | 0.34 |
| ▸ | KIF11 | P52732 | 2/20 | 0.33 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21189631 | 0.95 | KIF11 (0.40) | ESR1ESR2RXRARXRBKIF11 | |
| SCHEMBL21189812 | 0.91 | KIF11 (0.31) | KIF11 | |
| SCHEMBL21189637 | 0.91 | KIF11 (0.31) | KIF11 | |
| SCHEMBL22737598 | 0.86 | ESR1 (0.39) | ESR1ESR2MAPTKMT2AMAPK1 | |
| SCHEMBL22738049 | 0.84 | — | — | |
| SCHEMBL21189678 | 0.83 | ESR1 (0.37) | ESR1ESR2PTPN1 | |
| SCHEMBL21189641 | 0.83 | KIF11 (0.35) | KIF11PTPN1CYP2C9 | |
| SCHEMBL22991378 | 0.82 | KIF11 (0.31) | KIF11 | |
| SCHEMBL22737576 | 0.80 | AR (0.36) | — | |
| SCHEMBL21189814 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3744710-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-02 | — | — | EP | disclosed |
| WO-2019142897-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | 三菱瓦斯化学株式会社 | 2019-07-25 | — | — | WO | disclosed |