SCHEMBL21189639

SCHEMBL21189639

Sc1ccccc1-c1cc(C(c2ccccc2)(c2ccccc2)c2ccc(S)c(-c3ccccc3S)c2)ccc1S

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.39
NPC1 O15118 2/20 0.39
CASP3 P42574 2/20 0.39
RAB9A P51151 2/20 0.39
SENP8 Q96LD8 2/20 0.39
SENP7 Q9BQF6 2/20 0.39
SENP6 Q9GZR1 2/20 0.39
PLA2G1B P04054 1/20 0.39
NFKB1 P19838 1/20 0.39
NFKB2 Q00653 1/20 0.39
RELA Q04206 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
ATG4B Q9Y4P1 1/20 0.39
TSHR P16473 1/20 0.33
LMNA P02545 1/20 0.32
MAPK1 P28482 1/20 0.32
ATM Q13315 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
IDO1 P14902 1/20 0.31
PTGDR2 Q9Y5Y4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22738134 0.92 NPC1 (0.38) ALDH1A1NPC1CASP3RAB9ASENP8
SCHEMBL22738053 0.89 KIF11 (0.36) ALDH1A1NPC1CASP3RAB9ASENP8
SCHEMBL22737555 0.87 TTR (0.45) TSHR
SCHEMBL21189643 0.85 KIF11 (0.38) ALDH1A1NPC1CASP3RAB9ASENP8
SCHEMBL21189674 0.81 ESR1 (0.47) ALDH1A1NPC1CASP3RAB9ASENP8
SCHEMBL22991338 0.79 TSHR (0.39) ALDH1A1TSHRMAPK1
SCHEMBL21189811 0.77 NPC1 (0.43) ALDH1A1NPC1CASP3RAB9ASENP8
SCHEMBL21189499 0.75 KIF11 (0.36) ALDH1A1NPC1RAB9ATSHRMAPK1
SCHEMBL21189635 0.74 ESR1 (0.40) ALDH1A1NPC1CASP3RAB9ASENP8
SCHEMBL21189815 0.73 NPC1 (0.40) ALDH1A1NPC1CASP3RAB9ASENP8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed