SCHEMBL21189643

SCHEMBL21189643

Sc1ccc(C(c2ccccc2)(c2ccccc2)c2ccc(S)c(-c3ccccc3)c2)cc1-c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.38
PTGDR2 Q9Y5Y4 2/20 0.36
BACE1 P56817 2/20 0.35
METAP2 P50579 1/20 0.34
ALDH1A1 P00352 3/20 0.33
TSHR P16473 1/20 0.33
MET P08581 1/20 0.32
NPC1 O15118 2/20 0.32
RAB9A P51151 2/20 0.32
PLA2G1B P04054 1/20 0.32
NFKB1 P19838 1/20 0.32
CASP3 P42574 1/20 0.32
NFKB2 Q00653 1/20 0.32
RELA Q04206 1/20 0.32
SENP8 Q96LD8 1/20 0.32
SENP7 Q9BQF6 1/20 0.32
SENP6 Q9GZR1 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
ATG4B Q9Y4P1 1/20 0.32
ALOX5 P09917 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189499 0.89 KIF11 (0.36) KIF11PTGDR2ALDH1A1TSHRNPC1
SCHEMBL21189646 0.87 RXRA (0.47) PTGDR2ALDH1A1NPC1RAB9AHPGD
SCHEMBL21189639 0.85 ALDH1A1 (0.39) PTGDR2ALDH1A1TSHRNPC1RAB9A
SCHEMBL31738420 0.85 ALDH1A1 (0.47) KIF11PTGDR2BACE1ALDH1A1NPC1
SCHEMBL22991295 0.85 ALDH1A1 (0.47) KIF11PTGDR2BACE1ALDH1A1NPC1
SCHEMBL28991373 0.82 KIF11 (0.54) KIF11PTGDR2BACE1METAP2ALDH1A1
SCHEMBL21189626 0.81 ESR1 (0.47) KIF11PTGDR2BACE1METAP2ALDH1A1
SCHEMBL22991293 0.81 CNR1 (0.44) KIF11PTGDR2BACE1METAP2ALDH1A1
SCHEMBL22991338 0.79 TSHR (0.39) KIF11ALDH1A1TSHR
SCHEMBL21189810 0.79 ESR1 (0.44) KIF11PTGDR2BACE1METAP2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed