SCHEMBL21189499

SCHEMBL21189499

Sc1ccc(C(c2ccccc2)(c2cccc(Br)c2)c2ccc(S)c(-c3ccccc3)c2)cc1-c1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 2/20 0.36
SMN1; SMN2 Q16637 3/20 0.34
NPC1 O15118 2/20 0.34
TSHR P16473 2/20 0.34
RAB9A P51151 2/20 0.34
TP53 P04637 1/20 0.34
ALDH1A1 P00352 4/20 0.34
HTT P42858 2/20 0.34
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA5A P35218 1/20 0.33
CA9 Q16790 1/20 0.33
MAPT P10636 2/20 0.33
GABRA1 P14867 1/20 0.32
GABRG2 P18507 1/20 0.32
GABRB3 P28472 1/20 0.32
GABRA5 P31644 1/20 0.32
GABRA3 P34903 1/20 0.32
MAPK1 P28482 1/20 0.32
MEN1 O00255 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21189643 0.89 KIF11 (0.38) KIF11SMN1; SMN2NPC1TSHRRAB9A
SCHEMBL22738053 0.88 KIF11 (0.36) KIF11SMN1; SMN2NPC1RAB9AALDH1A1
SCHEMBL25254976 0.80 KIF11 (0.49) KIF11SMN1; SMN2NPC1TSHRRAB9A
SCHEMBL22934018 0.80 KIF11 (0.49) KIF11SMN1; SMN2NPC1TSHRRAB9A
SCHEMBL21189646 0.78 RXRA (0.47) SMN1; SMN2NPC1RAB9AALDH1A1CA1
SCHEMBL28937432 0.76 MAPK1 (0.46) NPC1TSHRRAB9ATP53ALDH1A1
SCHEMBL21189639 0.75 ALDH1A1 (0.39) SMN1; SMN2NPC1TSHRRAB9AALDH1A1
SCHEMBL31235560 0.75 ALDH1A1 (0.46) KIF11SMN1; SMN2NPC1TSHRRAB9A
SCHEMBL23751568 0.75 ALDH1A1 (0.46) KIF11SMN1; SMN2NPC1TSHRRAB9A
SCHEMBL22991295 0.75 ALDH1A1 (0.47) KIF11NPC1RAB9AALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed