SCHEMBL21189668

SCHEMBL21189668

CSc1ccc(C2c3c(ccc4ccc(O)cc34)Oc3ccc4ccc(O)cc4c32)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.43
KMT2A Q03164 3/20 0.43
ALDH1A1 P00352 2/20 0.43
FGB P02675 1/20 0.43
HPGD P15428 1/20 0.43
TNNI3 P19429 1/20 0.43
TNNT2 P45379 1/20 0.43
RECQL P46063 1/20 0.43
TNNC1 P63316 1/20 0.43
LMNA P02545 2/20 0.42
MYB P10242 1/20 0.37
NPSR1 Q6W5P4 3/20 0.35
TRPV1 Q8NER1 1/20 0.34
CFTR P13569 1/20 0.34
GOPC Q9HD26 1/20 0.34
ALOX15 P16050 2/20 0.33
TSHR P16473 2/20 0.33
CYP3A4 P08684 1/20 0.33
HIF1A Q16665 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22167536 0.85 MEN1 (0.46) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL24747280 0.84 MEN1 (0.47) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL19842300 0.82 MEN1 (0.46) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL17207357 0.81 LMNA (0.51) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL15998808 0.80 ESR1 (0.45) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL15998767 0.78 MEN1 (0.43) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL21755801 0.78 MEN1 (0.45) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL21755804 0.78 MEN1 (0.45) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL17207355 0.78 LMNA (0.46) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL23861455 0.77 MEN1 (0.40) MEN1KMT2AALDH1A1FGBHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210047457-A1 COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-02-18 US disclosed
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed