SCHEMBL21755804

SCHEMBL21755804

Cc1cc(C2c3c(ccc4ccc(O)cc34)Oc3ccc4ccc(O)cc4c32)cc(C)c1O

nearest known ligand 0.45

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.45
KMT2A Q03164 4/20 0.45
ALDH1A1 P00352 1/20 0.45
FGB P02675 1/20 0.45
HPGD P15428 1/20 0.45
TNNI3 P19429 1/20 0.45
TNNT2 P45379 1/20 0.45
RECQL P46063 1/20 0.45
TNNC1 P63316 1/20 0.45
LMNA P02545 1/20 0.43
CYP1A2 P05177 1/20 0.35
CYP2C19 P33261 1/20 0.35
NPSR1 Q6W5P4 3/20 0.34
TTR P02766 1/20 0.33
GAA P10253 1/20 0.33
CFTR P13569 1/20 0.33
GOPC Q9HD26 1/20 0.33
MCL1 Q07820 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23960138 0.92 MEN1 (0.42) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL18613173 0.89 MEN1 (0.41) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL21755801 0.86 MEN1 (0.45) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL22167536 0.84 MEN1 (0.46) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL23587443 0.83 NPSR1 (0.37) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL24747280 0.81 MEN1 (0.47) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL17207357 0.81 LMNA (0.51) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL18613170 0.81 MEN1 (0.47) MEN1KMT2AALDH1A1FGBHPGD
SCHEMBL18614342 0.80 MEN1 (0.41) MEN1KMT2AALDH1A1HPGDNPSR1
SCHEMBL17207360 0.79 LMNA (0.45) MEN1KMT2AALDH1A1FGBHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3842491-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-06-30 EP disclosed
WO-2020040162-A1 COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM 三菱瓦斯化学株式会社 2020-02-27 WO disclosed