Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22991339 | 0.83 | TSHR (0.36) | TSHRALDH1A1KCNN4 | |
| SCHEMBL21189657 | 0.80 | ESR1 (0.39) | TSHRALDH1A1CYP3A4CYP2D6KCNN4 | |
| SCHEMBL21189687 | 0.78 | TSHR (0.42) | TSHRALDH1A1KCNN4 | |
| SCHEMBL21189641 | 0.73 | KIF11 (0.35) | TSHRALDH1A1 | |
| SCHEMBL22991335 | 0.72 | TSHR (0.37) | TSHRALDH1A1KCNN4 | |
| SCHEMBL21189688 | 0.72 | KCNN4 (0.39) | TSHRALDH1A1CYP3A4KCNN4 | |
| SCHEMBL21189658 | 0.71 | KIF11 (0.41) | ALDH1A1 | |
| SCHEMBL22991305 | 0.69 | — | — | |
| SCHEMBL6514872 | 0.68 | TRPV4 (0.31) | — | |
| SCHEMBL21189663 | 0.68 | ESR1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210047457-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-18 | — | — | US | disclosed |
| EP-3744710-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-02 | — | — | EP | disclosed |
| WO-2019142897-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | 三菱瓦斯化学株式会社 | 2019-07-25 | — | — | WO | disclosed |