Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 1/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.31 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.31 |
| ▸ | DCLRE1A | Q6PJP8 | 1/20 | 0.30 |
| ▸ | DCLRE1B | Q9H816 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21189497 | 0.88 | KIF11 (0.34) | KIF11PTPN1ALDH1A1 | |
| SCHEMBL21189644 | 0.87 | RXRA (0.47) | CYP2C9 | |
| SCHEMBL22991339 | 0.85 | TSHR (0.36) | ALDH1A1TSHR | |
| SCHEMBL21189809 | 0.83 | ESR1 (0.35) | KIF11PTPN1CYP2C9 | |
| SCHEMBL21189631 | 0.78 | KIF11 (0.40) | KIF11PTPN1CYP2C9PTPN5ALOX5 | |
| SCHEMBL21189690 | 0.73 | TSHR (0.36) | ALDH1A1TSHR | |
| SCHEMBL21189637 | 0.73 | KIF11 (0.31) | KIF11 | |
| SCHEMBL21189812 | 0.73 | KIF11 (0.31) | KIF11 | |
| SCHEMBL21189687 | 0.72 | TSHR (0.42) | KIF11ALDH1A1TSHR | |
| SCHEMBL9115854 | 0.72 | KIF11 (0.39) | KIF11CYP2C9ALDH1A1TSHRALOX5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210047457-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-18 | — | — | US | disclosed |
| EP-3744710-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-02 | — | — | EP | disclosed |
| WO-2019142897-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | 三菱瓦斯化学株式会社 | 2019-07-25 | — | — | WO | disclosed |