⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13523920 | 0.78 | ALDH1A1 (0.41) | — | |
| SCHEMBL16373431 | 0.78 | TP53 (0.32) | — | |
| SCHEMBL52004 | 0.78 | ESR1 (0.50) | — | |
| SCHEMBL6277129 | 0.77 | TAAR1 (0.43) | — | |
| SCHEMBL19267930 | 0.75 | CA1 (0.44) | — | |
| SCHEMBL21798744 | 0.75 | ESR1 (0.34) | — | |
| SCHEMBL15165493 | 0.74 | FPR2 (0.38) | — | |
| SCHEMBL8374002 | 0.74 | ESR1 (0.53) | — | |
| SCHEMBL30509597 | 0.74 | KIF11 (0.50) | — | |
| SCHEMBL14313654 | 0.74 | FPR2 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210047457-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-18 | — | — | US | disclosed |
| EP-3744710-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-02 | — | — | EP | disclosed |
| WO-2019142897-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | 三菱瓦斯化学株式会社 | 2019-07-25 | — | — | WO | disclosed |