Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGLL | Q99685 | 14/20 | 0.72 |
| ▸ | FAAH | O00519 | 6/20 | 0.72 |
| ▸ | HSP90AA1 | P07900 | 4/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.58 |
| ▸ | PKM | P14618 | 2/20 | 0.58 |
| ▸ | HTT | P42858 | 2/20 | 0.58 |
| ▸ | ATM | Q13315 | 2/20 | 0.58 |
| ▸ | HPN | P05981 | 1/20 | 0.53 |
| ▸ | G6PD | P11413 | 1/20 | 0.44 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | CCR6 | P51684 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4459418 | 0.98 | MGLL (0.70) | MGLLFAAHHSP90AA1ALDH1A1PKM | |
| SCHEMBL29353079 | 0.98 | MGLL (0.70) | MGLLFAAHHSP90AA1ALDH1A1PKM | |
| SCHEMBL331661 | 0.98 | MGLL (0.70) | MGLLFAAHHSP90AA1ALDH1A1PKM | |
| SCHEMBL29352936 | 0.98 | MGLL (0.70) | MGLLFAAHHSP90AA1ALDH1A1PKM | |
| SCHEMBL30104191 | 0.98 | MGLL (0.70) | MGLLFAAHHSP90AA1ALDH1A1PKM | |
| SCHEMBL332317 | 0.98 | MGLL (0.70) | MGLLFAAHHSP90AA1ALDH1A1PKM | |
| SCHEMBL1271670 | 0.98 | MGLL (0.70) | MGLLFAAHHSP90AA1ALDH1A1PKM | |
| SCHEMBL4459406 | 0.98 | MGLL (0.70) | MGLLFAAHHSP90AA1ALDH1A1PKM | |
| SCHEMBL9491223 | 0.96 | MGLL (0.70) | MGLLFAAHHSP90AA1ALDH1A1PKM | |
| SCHEMBL487151 | 0.96 | MGLL (0.70) | MGLLFAAHHSP90AA1ALDH1A1PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109689742-B | Curable resin mixture and method for producing curable resin composition | 昭和电工株式会社 | 2021-12-10 | — | — | CN | disclosed |
| US-20210284783-A1 | METHODS FOR PRODUCING CURABLE RESIN MIXTURE AND CURABLE RESIN COMPOSITION | SHOWA DENKO K.K. (JP) | 2021-09-16 | — | — | US | disclosed |
| CN-113316597-A | Thermosetting resin composition | 昭和电工株式会社 | 2021-08-27 | — | — | CN | disclosed |
| US-10689493-B2 | Thermosetting resin composition | SHOWA DENKO K.K. (JP) | 2020-06-23 | — | — | US | disclosed |
| WO-2020070531-A1 | CURABLE RESIN COMPOSITION, CURED OBJECT THEREFROM, METHOD FOR PRODUCING STRUCTURE USING SAID CURABLE RESIN COMPOSITION, AND STRUCTURE INCLUDING SAID CURED OBJECT | 昭和電工株式会社 | 2020-04-09 | — | — | WO | disclosed |
| EP-3613781-A1 | CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND STRUCTURE INCLUDING CURED PRODUCT THEREOF | Showa Denko K.K. (JP) | 2020-02-26 | — | — | EP | disclosed |
| EP-3613780-A1 | CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND STRUCTURE INCLUDING CURED PRODUCT THEREOF | Showa Denko K.K. (JP) | 2020-02-26 | — | — | EP | disclosed |
| US-20200031966-A1 | CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND STRUCTURE INCLUDING CURED PRODUCT THEREOF | SHOWA DENKO K.K. (JP) | 2020-01-30 | — | — | US | disclosed |
| US-20200031973-A1 | CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, AND STRUCTURE INCLUDING CURED PRODUCT THEREOF | SHOWA DENKO K.K. (JP) | 2020-01-30 | — | — | US | disclosed |
| EP-3239199-B1 | THERMOSETTING RESIN COMPOSITION | SHOWA DENKO KK (JP) | 2019-09-25 | — | — | EP | disclosed |
| EP-3239199-A1 | THERMOSETTING RESIN COMPOSITION | Showa Denko K.K. (JP) | 2017-11-01 | — | — | EP | disclosed |
| CN-107108821-A | Thermosetting resin composition | 昭和电工株式会社 | 2017-08-29 | — | — | CN | disclosed |
| CN-107001547-A | Thermosetting resin composition | 昭和电工株式会社 | 2017-08-01 | — | — | CN | disclosed |
| US-8871894-B2 | Production method of polyhydroxyimide | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-10-28 | — | — | US | disclosed |
| US-8796393-B2 | Production method of polyhydroxyimide and positive photosensitive resin composition containing polyhydroxyimide obtained by the production method | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-20130131282-A1 | PRODUCTION METHOD OF POLYHYDROXYIMIDE AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING POLYHYDROXYIMIDE OBTAINED BY THE PRODUCTION METHOD | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20120094232-A1 | PRODUCTION METHOD OF POLYHYDROXYIMIDE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-04-19 | — | — | US | disclosed |
| US-20100304291-A1 | PRODUCTION METHOD OF POLYHYDROXYIMIDE AND POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING POLYHYDROXYIMIDE OBTAINED BY THE PRODUCTION METHOD | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| EP-0515170-A2 | Biscyclobutarene/polymaleimide copolymers | THE DOW CHEMICAL COMPANY (US) | 1992-11-25 | — | — | EP | disclosed |
| US-4607093-A | Sydnone based polyimide | THE DOW CHEMICAL COMPANY (US) | 1986-08-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120094232-A1 | PRODUCTION METHOD OF POLYHYDROXYIMIDE | GRHPR, MRPL21, F12 | MGLL 2201/4885FAAH 1572/4885HSP90AA1 622/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.