SCHEMBL21241671

SCHEMBL21241671

Cc1ccc(C(c2cc(-c3ccc(O)cc3)ccc2O)c2cc(-c3ccc(O)cc3)ccc2O)cc1

nearest known ligand 0.51

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 1/20 0.46
MCL1 Q07820 1/20 0.44
ACHE P22303 1/20 0.43
ESR1 P03372 8/20 0.42
ESR2 Q92731 7/20 0.42
MGLL Q99685 1/20 0.40
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
HSD17B1 P14061 2/20 0.38
HSD17B2 P37059 2/20 0.38
MAPKAPK2 P49137 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18624958 0.94 MMP3 (0.44) ALOX5MCL1ACHEESR1ESR2
SCHEMBL18623947 0.91 ALOX5 (0.54) ALOX5ESR1ESR2MGLLMEN1
SCHEMBL22316997 0.91 ALOX5 (0.54) ALOX5ESR1ESR2MGLLMEN1
SCHEMBL18380942 0.91 ALOX5 (0.54) ALOX5ESR1ESR2MGLLMEN1
SCHEMBL22317289 0.87 ALOX5 (0.46) ALOX5ESR1ESR2MGLLMEN1
SCHEMBL18381164 0.85 MMP3 (0.52) ALOX5MCL1ESR1ESR2MGLL
SCHEMBL19864010 0.85 MMP3 (0.52) ALOX5MCL1ESR1ESR2MGLL
SCHEMBL13416160 0.84 TRPA1 (0.43) ACHEESR1ESR2MEN1KMT2A
SCHEMBL22317304 0.84 ALOX5 (0.43) ALOX5MCL1ESR1ESR2MGLL
SCHEMBL19986224 0.83 ALOX5 (0.46) ALOX5ESR1ESR2MGLLMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200247739-A1 COMPOUND, RESIN, COMPOSITION, PATTERN FORMATION METHOD, AND PURIFICATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-08-06 US disclosed
WO-2020145407-A1 POLYCYCLIC POLYPHENOL RESIN AND PRODUCTION METHOD FOR POLYCYCLIC POLYPHENOL RESIN 三菱瓦斯化学株式会社 2020-07-16 WO disclosed
WO-2020145406-A1 FILM FORMING COMPOSITION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY, METHOD FOR PRODUCING LOWER LAYER FILM FOR LITHOGRAPHY, AND CIRCUIT PATTERN FORMATION METHOD 三菱瓦斯化学株式会社 2020-07-16 WO disclosed
WO-2020138147-A1 COMPOUND, RESIN, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN AND PURIFICATION METHOD 三菱瓦斯化学株式会社 2020-07-02 WO disclosed
WO-2019151403-A1 COMPOSITION, RESIST-PATTERN FORMING METHOD, AND INSULATING-FILM FORMING METHOD 三菱瓦斯化学株式会社 2019-08-08 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200247739-A1 COMPOUND, RESIN, COMPOSITION, PATTERN FORMATION METHOD, AND PURIFICATION METHOD CROCC, RDX, RBBP9 ALOX5 273/4885MCL1 3294/4885ACHE 2654/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.