Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX5 | P09917 | 1/20 | 0.54 |
| ▸ | ESR1 | P03372 | 10/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.45 |
| ▸ | ESR2 | Q92731 | 9/20 | 0.44 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.42 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.42 |
| ▸ | ABL1 | P00519 | 1/20 | 0.41 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.41 |
| ▸ | BCR | P11274 | 1/20 | 0.41 |
| ▸ | MGLL | Q99685 | 1/20 | 0.41 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.40 |
| ▸ | CYP11B1 | P15538 | 1/20 | 0.40 |
| ▸ | CYP11B2 | P19099 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18380942 | 1.00 | ALOX5 (0.54) | ALOX5ESR1MEN1KMT2AESR2 | |
| SCHEMBL22316997 | 1.00 | ALOX5 (0.54) | ALOX5ESR1MEN1KMT2AESR2 | |
| SCHEMBL19864010 | 0.93 | MMP3 (0.52) | ALOX5ESR1MEN1KMT2AESR2 | |
| SCHEMBL18381164 | 0.93 | MMP3 (0.52) | ALOX5ESR1MEN1KMT2AESR2 | |
| SCHEMBL22317289 | 0.91 | ALOX5 (0.46) | ALOX5ESR1MEN1KMT2AESR2 | |
| SCHEMBL21241671 | 0.91 | ALOX5 (0.46) | ALOX5ESR1MEN1KMT2AESR2 | |
| SCHEMBL19986224 | 0.91 | ALOX5 (0.46) | ALOX5ESR1MEN1KMT2AESR2 | |
| SCHEMBL19842186 | 0.91 | ALOX5 (0.48) | ALOX5ESR1MEN1KMT2AESR2 | |
| SCHEMBL18381150 | 0.88 | ESR1 (0.48) | ALOX5ESR1MEN1KMT2AESR2 | |
| SCHEMBL18637069 | 0.88 | ESR1 (0.48) | ALOX5ESR1MEN1KMT2AESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022176571-A1 | RESIN, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR REFINING RESIN | 三菱瓦斯化学株式会社 | 2022-08-25 | — | — | WO | disclosed |
| US-11067889-B2 | Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-07-20 | — | — | US | disclosed |
| US-10550068-B2 | Compound and method for producing same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-02-04 | — | — | US | disclosed |
| US-10303055-B2 | Resist composition and method for forming resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-05-28 | — | — | US | disclosed |
| US-10294183-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-05-21 | — | — | US | disclosed |
| US-20180201570-A1 | NOVEL COMPOUND AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-07-19 | — | — | US | disclosed |
| US-20180201570-A1 | NOVEL COMPOUND AND METHOD FOR PRODUCING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-07-19 | — | — | US | disclosed |
| EP-3345889-A1 | COMPOUND AND METHOD FOR PRODUCING SAME, COMPOSITION, COMPOSITION FOR FORMING OPTICAL COMPONENT, COMPOSITION FOR FORMING LITHOGRAPHY FILM, RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, MATERIAL FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, COMPOSITION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR PRODUCING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-07-11 | — | — | EP | disclosed |
| EP-3327505-A1 | NOVEL COMPOUND AND METHOD FOR PRODUCING SAME | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-05-30 | — | — | EP | disclosed |
| US-20170075220-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170075220-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170073288-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING THE COMPOUND OR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170073288-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING THE COMPOUND OR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-03-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10303055-B2 | Resist composition and method for forming resist pattern | HEATR1, ABCC1, HEATR6 | ALOX5 645/4885ESR1 1708/4885MEN1 3775/4885 |
| US-20170073288-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING THE COMPOUND OR RESIN | PRDM9, EBPL, CDH1 | ALOX5 61/4885ESR1 447/4885MEN1 3943/4885 |
| US-11067889-B2 | Compound, composition, and method for producing same, underlayer film forming material for lithography, composition for underlayer film formation for lithography, and purification method | C5, C9, PRMT9 | ALOX5 1088/4885ESR1 1606/4885MEN1 146/4885 |
| US-10550068-B2 | Compound and method for producing same | C5, CBR1, MTR | ALOX5 356/4885ESR1 2037/4885MEN1 785/4885 |
| US-10294183-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin | PRDM9, EBPL, CDH1 | ALOX5 61/4885ESR1 447/4885MEN1 3943/4885 |
| US-20180201570-A1 | NOVEL COMPOUND AND METHOD FOR PRODUCING SAME | C5, CBR3, CBR1 | ALOX5 531/4885ESR1 2141/4885MEN1 1294/4885 |
| US-20170075220-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | HEATR1, ABCC1, HEATR6 | ALOX5 645/4885ESR1 1708/4885MEN1 3775/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.