Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SHBG | P04278 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 4/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | CASP7 | P55210 | 1/20 | 0.34 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.33 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.33 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7529731 | 0.96 | SHBG (0.44) | SHBGALDH1A1HSD17B10KDM4EHPGD | |
| SCHEMBL7523362 | 0.96 | SHBG (0.44) | SHBGALDH1A1HSD17B10KDM4EHPGD | |
| SCHEMBL22271434 | 0.94 | SHBG (0.43) | SHBGALDH1A1HSD17B10KDM4EHPGD | |
| SCHEMBL8345472 | 0.93 | SHBG (0.42) | SHBGALDH1A1HSD17B10KDM4EHPGD | |
| SCHEMBL7094938 | 0.91 | AMY1A (0.47) | SHBGALDH1A1HSD17B10KDM4EHPGD | |
| SCHEMBL8351608 | 0.89 | SHBG (0.40) | SHBGALDH1A1HSD17B10KDM4EHPGD | |
| SCHEMBL22039928 | 0.89 | SHBG (0.40) | SHBGALDH1A1HSD17B10KDM4EHPGD | |
| SCHEMBL209921 | 0.89 | SHBG (0.43) | SHBGALDH1A1HSD17B10KDM4EHPGD | |
| SCHEMBL7522113 | 0.89 | SHBG (0.48) | SHBGALDH1A1HSD17B10KDM4EHPGD | |
| SCHEMBL209920 | 0.87 | SHBG (0.41) | SHBGALDH1A1HSD17B10KDM4EHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0731074-B1 | Tetraphenol compounds, process for producing the same and their use as photosensitisers | SUMITOMO CHEMICAL CO (JP) | 1999-09-22 | — | — | EP | claimed |
| US-5726217-A | PHOTOSENSITIZERS FOR POSITIVE RESISTS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-03-10 | — | — | US | claimed |
| EP-0731074-A2 | Tetraphenol compounds, process for producing the same and their use as photosensitisers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-09-11 | — | — | EP | claimed |
| JP-8245461-A | — | — | None | — | — | JP | disclosed |
| JP-11052565-A | — | — | None | — | — | JP | disclosed |
| JP-9110761-A | — | — | None | — | — | JP | disclosed |
| CN-120117968-A | Process for preparing hydroxy-ortho-hydroxymethyl substituted methylene bridged substituted phenols and polyphenols containing multiple phenol units | 天津久日半导体材料有限公司 | 2025-06-10 | — | — | CN | disclosed |
| CN-119751218-A | Synthesis method of 4- [1, 1-bis- (4-hydroxy-3-methylphenyl) -ethyl ] -benzene-1, 2-diol | 辽宁靖帆新材料有限公司 | 2025-04-04 | — | — | CN | disclosed |
| WO-2024071364-A1 | POLYMER COMPOSITION AND SINGLE-LAYER RETARDATION MATERIAL | 日産化学株式会社 | 2024-04-04 | — | — | WO | disclosed |
| WO-2023095925-A1 | POLYMER COMPOSITION AND SINGLE-LAYER RETARDATION MATERIAL | 日産化学株式会社 | 2023-06-01 | — | — | WO | disclosed |
| WO-2023085390-A1 | LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2023-05-19 | — | — | WO | disclosed |
| EP-0731074-B1 | Tetraphenol compounds, process for producing the same and their use as photosensitisers | SUMITOMO CHEMICAL CO (JP) | 1999-09-22 | — | — | EP | disclosed |
| EP-0902326-A2 | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-03-17 | — | — | EP | disclosed |
| JP-H1152565-A | POLYPHENOL COMPOUND AND ITS QUINONEDIAZIDE ESTER AND POSITIVE PHOTORESIST COMPOSITION | TOKYO OHKA KOGYO CO LTD | 1999-02-26 | — | — | JP | disclosed |
| US-5866724-A | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-02 | — | — | US | disclosed |
| US-5726217-A | PHOTOSENSITIZERS FOR POSITIVE RESISTS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-03-10 | — | — | US | disclosed |
| JP-H09110761-A | PRODUCTION OF TETRAPHENOL COMPOUND | SUMITOMO CHEM CO LTD | 1997-04-28 | — | — | JP | disclosed |
| EP-0769485-A1 | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-04-23 | — | — | EP | disclosed |
| JP-H08245461-A | TETRAPHENOL COMPOUND, ITS PRODUCTION AND USE | SUMITOMO CHEM CO LTD | 1996-09-24 | — | — | JP | disclosed |
| EP-0731074-A2 | Tetraphenol compounds, process for producing the same and their use as photosensitisers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1996-09-11 | — | — | EP | disclosed |