SCHEMBL8345472

SCHEMBL8345472

Cc1cc(Cc2cc(C)c(O)c(CO)c2C)c(O)c(CO)c1C

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.42
HSD17B10 Q99714 3/20 0.33
ALDH1A1 P00352 3/20 0.33
KDM4E B2RXH2 1/20 0.33
HPGD P15428 1/20 0.33
AMY1A P0DUB6 1/20 0.33
HSPA5 P11021 1/20 0.33
HIF1A Q16665 3/20 0.33
CYP2C9 P11712 2/20 0.33
CYP2C19 P33261 2/20 0.33
CYP2D6 P10635 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
TRPV4 Q9HBA0 1/20 0.31
CYP1A2 P05177 1/20 0.31
ALOX15 P16050 1/20 0.31
CASP7 P55210 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8351608 0.97 SHBG (0.40) SHBGHSD17B10ALDH1A1KDM4EHPGD
SCHEMBL212514 0.93 SHBG (0.47) SHBGHSD17B10ALDH1A1KDM4EHPGD
SCHEMBL4058032 0.93 SHBG (0.42) SHBGHSD17B10ALDH1A1KDM4EHPGD
SCHEMBL7529731 0.89 SHBG (0.44) SHBGHSD17B10ALDH1A1KDM4EHPGD
SCHEMBL7523362 0.89 SHBG (0.44) SHBGHSD17B10ALDH1A1KDM4EHPGD
SCHEMBL7094938 0.88 AMY1A (0.47) SHBGHSD17B10ALDH1A1KDM4EHPGD
SCHEMBL22271434 0.87 SHBG (0.43) SHBGHSD17B10ALDH1A1KDM4EHPGD
SCHEMBL12175480 0.87 SHBG (0.48) SHBGHSD17B10ALDH1A1KDM4EHPGD
SCHEMBL22039928 0.86 SHBG (0.40) SHBGHSD17B10ALDH1A1KDM4EHPGD
SCHEMBL209921 0.83 SHBG (0.43) SHBGHSD17B10ALDH1A1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5866724-A Positive resist composition and photosensitizers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-02 US disclosed
EP-0769485-A1 Positive resist composition and photosensitizers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1997-04-23 EP disclosed