Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | SHBG | P04278 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | SELL | P14151 | 1/20 | 0.30 |
| ▸ | SELP | P16109 | 1/20 | 0.30 |
| ▸ | SELE | P16581 | 1/20 | 0.30 |
| ▸ | ACHE | P22303 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22039928 | 0.92 | SHBG (0.40) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL212514 | 0.91 | SHBG (0.47) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL8501631 | 0.90 | SHBG (0.46) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL8587659 | 0.90 | SHBG (0.46) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL12430568 | 0.88 | AMY1A (0.49) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL8345472 | 0.88 | SHBG (0.42) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL7529731 | 0.87 | SHBG (0.44) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL7523362 | 0.87 | SHBG (0.44) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL7098334 | 0.86 | AMY1A (0.47) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 | |
| SCHEMBL22271434 | 0.86 | SHBG (0.43) | AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116360213-A | Resin composition and photoresist patterning method using the same | 深圳市容大感光科技股份有限公司 | 2023-06-30 | — | — | CN | claimed |
| EP-0769485-B1 | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL CO (JP) | 2002-03-13 | — | — | EP | claimed |
| US-5866724-A | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-02 | — | — | US | claimed |
| EP-0769485-A1 | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-04-23 | — | — | EP | claimed |
| JP-9110762-A | — | — | None | — | — | JP | disclosed |
| JP-9110751-A | — | — | None | — | — | JP | disclosed |
| JP-9110759-A | — | — | None | — | — | JP | disclosed |
| CN-116360213-A | Resin composition and photoresist patterning method using the same | 深圳市容大感光科技股份有限公司 | 2023-06-30 | — | — | CN | disclosed |
| US-6620978-B2 | Esterification of a quinonediazide compound; photosensitizer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-09-16 | — | — | US | disclosed |
| US-20030054283-A1 | Positive photoresist composition and process for synthesizing polyphenol compound | TOKYO OHKA KOGYO CO., LTD. | 2003-03-20 | — | — | US | disclosed |
| US-6492085-B1 | PHOTOSENSITIZER COMPRISED OF MIXED PRODUCT OF QUINONEDIAZIDE WITH SUCH AS 2,6-BIS(4-HYDROXY-3-(2-HYDROXY-3,5-DIMETHYL-BENZYL)-2,5-DIMETHYLBENZYL)-4 -METHYLPHENOL AND ALKALI SOLUBLE RESIN; DENSE, ISOLATION, AND DOT PATTERNS WITH GOOD SHAPES | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-12-10 | — | — | US | disclosed |
| EP-0769485-B1 | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL CO (JP) | 2002-03-13 | — | — | EP | disclosed |
| US-5866724-A | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-02-02 | — | — | US | disclosed |
| JP-H09110751-A | PRODUCTION OF PENTANUCLEAR NOVOLAC COMPOUND | SUMITOMO CHEM CO LTD | 1997-04-28 | — | — | JP | disclosed |
| JP-H09110762-A | PENTAPHENOL COMPOUND AND ITS USE | SUMITOMO CHEM CO LTD | 1997-04-28 | — | — | JP | disclosed |
| JP-H09110759-A | DIMETHYLOLATED TREIPHENOL COMPOUND AND ITS PRODUCTION | SUMITOMO CHEM CO LTD | 1997-04-28 | — | — | JP | disclosed |
| EP-0769485-A1 | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-04-23 | — | — | EP | disclosed |