SCHEMBL21396620

SCHEMBL21396620

CCOC(=O)C(SC(=O)C(C1CCCCC1)C1CCCCC1)S(=O)(=O)O

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.41
ALDH1A1 P00352 4/20 0.39
NPSR1 Q6W5P4 1/20 0.39
L3MBTL1 Q9Y468 3/20 0.38
THRB P10828 1/20 0.35
ATM Q13315 1/20 0.35
EPHX1 P07099 1/20 0.35
KDM4E B2RXH2 1/20 0.34
LMNA P02545 2/20 0.34
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27437532 0.81 ALDH1A1 (0.42) TSHRALDH1A1NPSR1L3MBTL1THRB
SCHEMBL21396542 0.76 TSHR (0.36) TSHRALDH1A1NPSR1L3MBTL1THRB
SCHEMBL27437068 0.72 L3MBTL1 (0.41) TSHRALDH1A1NPSR1L3MBTL1THRB
SCHEMBL17793351 0.69 ALDH1A1 (0.62) TSHRALDH1A1NPSR1L3MBTL1THRB
SCHEMBL31409193 0.69 ALDH1A1 (0.62) TSHRALDH1A1NPSR1L3MBTL1THRB
SCHEMBL1785494 0.69 ALDH1A1 (0.54) TSHRALDH1A1NPSR1L3MBTL1THRB
SCHEMBL1433202 0.69 ALDH1A1 (0.62) TSHRALDH1A1NPSR1L3MBTL1THRB
SCHEMBL660922 0.69 ALDH1A1 (0.54) TSHRALDH1A1NPSR1L3MBTL1THRB
SCHEMBL18022794 0.69 ALDH1A1 (0.62) TSHRALDH1A1NPSR1L3MBTL1THRB
SCHEMBL934442 0.68 ALDH1A1 (0.47) TSHRALDH1A1NPSR1L3MBTL1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20210318616-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-10-14 US disclosed
US-11073762-B2 Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator FUJIFILM CORPORATION (JP) 2021-07-27 US disclosed
WO-2020137918-A1 NEGATIVE-TYPE ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, RESIST FILM, PATTERN-FORMING METHOD, AND ELECTRONIC DEVICE PRODUCTION METHOD 富士フイルム株式会社 2020-07-02 WO disclosed
WO-2020129683-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE 富士フイルム株式会社 2020-06-25 WO disclosed
US-20190294043-A1 ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC RAYSENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND PHOTOACID GENERATOR FUJIFILM CORPORATION (JP) 2019-09-26 US disclosed
US-20190294042-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-09-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11073762-B2 Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator PRKAR2A, PRKAR2B, RER1 TSHR 1063/4885ALDH1A1 2149/4885NPSR1 1617/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.