SCHEMBL21396635

SCHEMBL21396635

O=C(OCC(F)(F)CS(=O)(=O)O)C(C1CCCCC1)C1CCCCC1

nearest known ligand 0.37

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 3/20 0.37
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
PDK1 Q15118 1/20 0.30
PDK2 Q15119 1/20 0.30
PDK3 Q15120 1/20 0.30
PDK4 Q16654 1/20 0.30
RAD52 P43351 1/20 0.30
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20013512 0.78 EPHX1 (0.36) EPHX1MEN1KMT2A
SCHEMBL27436722 0.78 EPHX1 (0.41) EPHX1MEN1KMT2APDK1PDK2
SCHEMBL10067115 0.72 EPHX1 (0.42) EPHX1RAD52
SCHEMBL15966351 0.69 ALDH1A1 (0.35) MEN1KMT2AHTT
SCHEMBL18775724 0.68 HPGD (0.34) EPHX1KMT2A
SCHEMBL5500497 0.68 PDK1 (0.37) EPHX1KMT2APDK1PDK2PDK3
SCHEMBL5501035 0.68 PDK1 (0.37) EPHX1KMT2APDK1PDK2PDK3
SCHEMBL10067134 0.68 EPHX1 (0.38) EPHX1RAD52
SCHEMBL6893065 0.68 EPHX1 (0.48) EPHX1RAD52
SCHEMBL18602900 0.67 PRKCA (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20210318616-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2021-10-14 US disclosed
US-11073762-B2 Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator FUJIFILM CORPORATION (JP) 2021-07-27 US disclosed
US-20190294043-A1 ACTINIC RAY-SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC RAYSENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND PHOTOACID GENERATOR FUJIFILM CORPORATION (JP) 2019-09-26 US disclosed
US-20190294042-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-09-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11073762-B2 Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generator PRKAR2A, PRKAR2B, RER1 EPHX1 190/4885MEN1 2388/4885KMT2A 2090/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.