Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13383886 | 0.84 | ADORA2B (0.40) | ADORA2BALDH1A1 | |
| SCHEMBL13645899 | 0.82 | ADORA2B (0.33) | ADORA2B | |
| SCHEMBL17783702 | 0.75 | ADORA2B (0.36) | ADORA2BALDH1A1 | |
| SCHEMBL19094969 | 0.75 | ADORA2B (0.47) | ADORA2BALDH1A1 | |
| SCHEMBL14591115 | 0.73 | ADORA2B (0.35) | ADORA2B | |
| SCHEMBL10046642 | 0.71 | PDE4A (0.41) | ADORA2B | |
| SCHEMBL15143908 | 0.69 | CYP3A4 (0.67) | ADORA2BALDH1A1 | |
| SCHEMBL14264220 | 0.66 | ADORA2B (0.34) | ADORA2B | |
| SCHEMBL18925441 | 0.63 | CYP3A4 (0.33) | — | |
| SCHEMBL837393 | 0.63 | ALDH1A1 (0.58) | ADORA2BALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024080351-A1 | LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2024-04-18 | — | — | WO | disclosed |
| US-20240117250-A1 | PHOTO-ALIGNMENT THERMOSETTING LIQUID CRYSTAL COMPOSITION, ALIGNMENT FILM-CUM-RETARDATION FILM AND PRODUCTION METHOD THEREFOR, RETARDATION PLATE AND PRODUCTION METHOD THEREFOR, OPTICAL MEMBER AND PRODUCTION METHOD THEREFOR, AND DISPLAY DEVICE | DAI NIPPON PRINTING CO., LTD. (JP) | 2024-04-11 | — | — | US | disclosed |
| WO-2024029475-A1 | WAVELENGTH CONVERSION FILM FORMING COMPOSITION | 日産化学株式会社 | 2024-02-08 | — | — | WO | disclosed |
| WO-2024024502-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2024-02-01 | — | — | WO | disclosed |
| WO-2024024501-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2024-02-01 | — | — | WO | disclosed |
| WO-2023204281-A1 | RESIN COMPOSITION FOR THERMOSETTING PHOTO-ALIGNMENT FILMS | 日産化学株式会社 | 2023-10-26 | — | — | WO | disclosed |
| WO-2023204280-A1 | CURED FILM-FORMING COMPOSITION, ALIGNMENT MATERIAL, AND RETARDATION MATERIAL | 日産化学株式会社 | 2023-10-26 | — | — | WO | disclosed |
| WO-2023182136-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE | 住友ベークライト株式会社 | 2023-09-28 | — | — | WO | disclosed |
| WO-2023157934-A1 | RESIN COMPOSITION FOR THERMOSETTING PHOTO-ALIGNMENT FILMS | 日産化学株式会社 | 2023-08-24 | — | — | WO | disclosed |
| WO-2023074171-A1 | RELEASE LAYER-FORMING COMPOSITION, LAMINATE, AND METHOD FOR MANUFACTURING LAMINATE | 日産化学株式会社 | 2023-05-04 | — | — | WO | disclosed |
| US-20070148557-A1 | Composition for forming nitride coating film for hard mask | NISSAN CHEMICAL INDUSTRIES, LT. (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070135581-A1 | Underlayer coating forming composition containing dextrin ester compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
| EP-1780600-A1 | LOWER LAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY INCLUDING NAPHTHALENE RING HAVING HALOGEN ATOM | Nissan Chemical Industries, Ltd. (JP) | 2007-05-02 | — | — | EP | disclosed |
| EP-1757985-A1 | ANTIREFLECTIVE FILM CONTAINING SULFUR ATOM | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20060210915-A1 | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-21 | — | — | US | disclosed |
| EP-1703328-A1 | COMPOSITION FOR FORMING NITRIDE COATING FILM FOR HARD MASK | Nissan Chemical Industries, Ltd. (JP) | 2006-09-20 | — | — | EP | disclosed |
| EP-1681594-A1 | COMPOSITION FOR FORMING UNDERLYING FILM CONTAINING DEXTRIN ESTER COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-07-19 | — | — | EP | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |