Ether

Ether

SCHEMBL2148363

C=CC.C=CC.C=CCOC(=O)C(=C)C.CCOCC.OCCO

nearest known ligand 0.50

Full drug profile on Sugi Atlas →

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.50
TSHR P16473 5/20 0.38
ALDH1A1 P00352 3/20 0.33
TDP1 Q9NUW8 1/20 0.33
CYP3A4 P08684 1/20 0.31
GLO1 Q04760 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL2865262 0.97 THRB (0.53) THRBTSHRALDH1A1TDP1CYP3A4
Ether SCHEMBL173935 0.92 THRB (0.58) THRBTSHRALDH1A1TDP1CYP3A4
Ethylene Glycol SCHEMBL6706940 0.88 TSHR (0.45) THRBTSHRALDH1A1TDP1CYP3A4
Ether SCHEMBL562465 0.85 ALDH1A1 (0.42) THRBTSHRALDH1A1TDP1CYP3A4
Ether SCHEMBL5396604 0.85 ALDH1A1 (0.42) THRBTSHRALDH1A1TDP1CYP3A4
Glycerin SCHEMBL1862655 0.84 THRB (0.47) THRBTSHRALDH1A1TDP1CYP3A4
Propylene Glycol SCHEMBL3670673 0.84 THRB (0.47) THRBTSHRALDH1A1TDP1CYP3A4
Methacrylic Acid SCHEMBL28243084 0.83 TSHR (0.41) THRBTSHRALDH1A1TDP1CYP3A4
Propane SCHEMBL15303767 0.82 THRB (0.48) THRBTSHRALDH1A1TDP1CYP3A4
SCHEMBL1057516 0.82 TSHR (0.50) THRBTSHRALDH1A1TDP1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114622406-B Piezoresistive yarn preparation method and piezoresistive yarn prepared by same 水木山海科技(佛山)有限责任公司 2023-10-13 CN claimed
CN-114622406-A Piezoresistive yarn preparation method and piezoresistive yarn prepared by piezoresistive yarn preparation method 佛山(华南)新材料研究院 2022-06-14 CN disclosed
US-20110163482-A1 PHOTO-CURABLE COMPOSITION HAVING INHERENTLY EXCELLENT RELEASING PROPERTY AND PATTERN TRANSFER PROPERTY, METHOD FOR TRANSFERRING PATTERN USINGTHE COMPOSITION AND LIGHT RECORDING MEDIUM HAVING POLYMER PATTERN LAYER PRODUCED USING THE COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-07-07 US disclosed
US-20080176049-A1 PHOTO-CURABLE COMPOSITION HAVING INHERENTLY EXCELLENT RELEASING PROPERtY AND PATTERN TRANSFER PROPERTY, METHOD FOR TRANSFERRING PATTERN USING THE COMPOSITION AND LIGHT RECORDING MEDIUM HAVING POLYMER PATTERN LAYER PRODUCED USING THE COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-07-24 US disclosed