SCHEMBL2149955

SCHEMBL2149955

CC(C)c1ccc2c(c1)[S+]([O-])c1ccccc1C2

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSP90AA1 P07900 1/20 0.35
HSP90AB1 P08238 1/20 0.35
CYP17A1 P05093 1/20 0.33
KIF11 P52732 1/20 0.33
HPGD P15428 2/20 0.31
HSD17B10 Q99714 2/20 0.31
GFER P55789 1/20 0.31
PDK2 Q15119 1/20 0.31
HTR2A P28223 1/20 0.31
BCHE P06276 1/20 0.31
ACHE P22303 1/20 0.31
LMNA P02545 2/20 0.31
KDM4E B2RXH2 1/20 0.30
ALDH1A1 P00352 1/20 0.30
MAPT P10636 1/20 0.30
MAPK1 P28482 1/20 0.30
HTT P42858 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL41595 0.90 HSP90AA1 (0.35) HSP90AA1HSP90AB1CYP17A1KIF11HPGD
SCHEMBL15281929 0.83 CHRM2 (0.32) HSP90AA1HSP90AB1CYP2D6CYP2C19
SCHEMBL2397416 0.81
SCHEMBL9160477 0.78 MAOA (0.39) HPGDHSD17B10HTR2ALMNAKDM4E
SCHEMBL36333 0.78 MAOA (0.39) HPGDHSD17B10HTR2ALMNAKDM4E
SCHEMBL10476775 0.78 MAOA (0.39) HPGDHSD17B10HTR2ALMNAKDM4E
SCHEMBL1037618 0.78 ALDH1A1 (0.34) HPGDHTR2AACHELMNAKDM4E
Hydrochloric Acid SCHEMBL585839 0.76 MAOA (0.37) HPGDHSD17B10HTR2ALMNAKDM4E
Ammonia Solution, Strong SCHEMBL1871983 0.76 MAOA (0.37) HPGDHSD17B10HTR2ALMNAKDM4E
SCHEMBL11046607 0.76 USP2 (0.36) CYP17A1HPGDHSD17B10ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1219238-C Positive resist composition SUMITOMO CHEMICAL CO (JP) 2005-09-14 CN claimed
US-6815140-B2 COMPRISING A NOVOLAC RESIN, A RADIATION-SENSITIVE QUINONEDIAZIDE COMPOUND, AND ALSO A THIOXANTHONE COMPOUND TO IMPROVE RESOLUTION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-09 US claimed
US-20020006574-A1 Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-17 US claimed
US-20010026905-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2001-10-04 US claimed
EP-0962826-A1 A positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-12-08 EP claimed
CN-1237719-A Positive resist composition SUMITOMO CHEMICAL CO (JP) 1999-12-08 CN claimed
CN-114105943-A 3-substituted thioxanthone compound, preparation method thereof and application of photopolymerization system 深圳有为技术控股集团有限公司 2022-03-01 CN disclosed
US-10928728-B2 Photoactivable nitrogen bases BASF SE (DE) 2021-02-23 US disclosed
US-20210033972-A1 PHOTOACTIVABLE NITROGEN BASES BASF SE (DE) 2021-02-04 US disclosed
EP-3440049-A1 TRIMETHYLOLPROPANE DERIVATIVES BASF SE (DE) 2019-02-13 EP disclosed
US-20180217498-A1 PHOTOACTIVABLE NITROGEN BASES BASF SE (DE) 2018-08-02 US disclosed
US-9921477-B2 Photoactivable nitrogen bases BASE SE (DE) 2018-03-20 US disclosed
CN-104558596-B Nitrogen-containing polyfunctionality acrylate resin, preparation method and application thereof 乐凯华光印刷科技有限公司 2017-02-01 CN disclosed
WO-2003091287-A1 INCORPORABLE PHOTOINITIATOR CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-11-06 WO disclosed
WO-2003089479-A2 CURING OF COATINGS INDUCED BY PLASMA CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-10-30 WO disclosed
WO-2003033500-A1 PHOTOACTIVABLE NITROGEN BASES CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2003-04-24 WO disclosed
US-20020006574-A1 Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-17 US disclosed
US-20010026905-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2001-10-04 US disclosed
EP-0962826-A1 A positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-12-08 EP disclosed
CN-1237719-A Positive resist composition SUMITOMO CHEMICAL CO (JP) 1999-12-08 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210033972-A1 PHOTOACTIVABLE NITROGEN BASES CBR1, ARNT, NR0B1 HSP90AA1 3708/4885HSP90AB1 3589/4885CYP17A1 258/4885
US-10928728-B2 Photoactivable nitrogen bases CBR1, NR0B1, NR0B2 HSP90AA1 3862/4885HSP90AB1 3783/4885CYP17A1 366/4885
US-20180217498-A1 PHOTOACTIVABLE NITROGEN BASES CBR1, NR0B1, NR0B2 HSP90AA1 3862/4885HSP90AB1 3783/4885CYP17A1 366/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.