SCHEMBL2149974

SCHEMBL2149974

CCCCCCCCCCCC[N+](C)(CCCCCCCCCCCC)CCCCCCCCCCCC.Cc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.47

Known targets — ChEMBL curated mechanism

ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MCHR1 Q99705 1/20 0.47
ALDH1A1 P00352 4/20 0.46
CYP2C9 P11712 4/20 0.44
LMNA P02545 3/20 0.44
TSHR P16473 2/20 0.44
KCNH2 Q12809 2/20 0.44
HTT P42858 2/20 0.44
CYP2C19 P33261 2/20 0.44
CYP2D6 P10635 1/20 0.44
HIF1A Q16665 1/20 0.44
L3MBTL1 Q9Y468 2/20 0.42
TDP1 Q9NUW8 2/20 0.41
ALB P02768 1/20 0.41
S1PR3 Q99500 1/20 0.41
CNR2 P34972 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
KDM4E B2RXH2 1/20 0.40
MAPT P10636 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP1A2 P05177 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2149641 1.00 MCHR1 (0.47) MCHR1ALDH1A1CYP2C9LMNATSHR
SCHEMBL2150501 1.00 MCHR1 (0.47) MCHR1ALDH1A1CYP2C9LMNATSHR
SCHEMBL2150307 1.00 MCHR1 (0.47) MCHR1ALDH1A1CYP2C9LMNATSHR
SCHEMBL9420172 0.94 MCHR1 (0.43) MCHR1ALDH1A1CYP2C9LMNATSHR
Tributylmethylammonium SCHEMBL3189548 0.94 ALDH1A1 (0.43) MCHR1ALDH1A1CYP2C9LMNATSHR
SCHEMBL11333816 0.93 CYP2C9 (0.44) MCHR1ALDH1A1CYP2C9LMNATSHR
SCHEMBL8723518 0.92 DNM1 (0.48) MCHR1ALDH1A1CYP2C9LMNATSHR
SCHEMBL699896 0.92 DNM1 (0.48) MCHR1ALDH1A1CYP2C9LMNATSHR
SCHEMBL2150523 0.92 DNM1 (0.48) MCHR1ALDH1A1CYP2C9LMNATSHR
Cetrimonium SCHEMBL583796 0.92 DNM1 (0.48) MCHR1ALDH1A1CYP2C9LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9290656-B2 Polymerizable composition for polythiourethane optical material MITSUI CHEMICALS, INC. (JP) 2016-03-22 US disclosed
EP-2341091-B1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, OPTICAL MATERIAL, AND METHOD FOR PREPARING THE OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2013-12-04 EP disclosed
EP-1988109-B1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS INC (JP) 2013-05-29 EP disclosed
US-8434866-B2 Polymerizable composition for optical material, optical material, and method for preparing the optical material MITSUI CHEMICALS, INC. (JP) 2013-05-07 US disclosed
US-20110190466-A1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2011-08-04 US disclosed
EP-2341091-A1 POLYMERIZABLE COMPOUND FOR OPTICAL MATERIAL, OPTICAL MATERIAL, AND OPTICAL MATERIAL MANUFACTURING METHOD Mitsui Chemicals, Inc. (JP) 2011-07-06 EP disclosed
US-20100075154-A1 POLYMERIZABLE COMPOSITION FOR OPTICAL MATERIAL, OPTICAL MATERIAL, AND METHOD FOR PREPARING THE OPTICAL MATERIAL MITSUI CHEMICALS, INC. (JP) 2010-03-25 US disclosed
EP-1988109-A1 POLYMERIZABLE COMPOSITION FOR POLYTHIOURETHANE OPTICAL MATERIAL Mitsui Chemicals, Inc. (JP) 2008-11-05 EP disclosed
EP-0149246-A2 Overcoat compositions containing nucleating agents and ion-selective electrodes for co2 determinations EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1985-07-24 EP disclosed
EP-0033707-B1 ELEMENT FOR LIQUID ANALYSIS HAVING INTERFERENT-REMOVAL ZONE AND METHOD FOR USING SAME EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1984-06-20 EP disclosed
EP-0030503-B1 BUFFER OVERCOAT FOR CO2 ION-SELECTIVE ELECTRODES EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1984-05-09 EP disclosed
US-4303408-A EXTRACTION ZONE BEFORE INDICATOR ZONE EASTMAN KODAK COMPANY (US) 1981-12-01 US disclosed
EP-0033707-A1 Element for liquid analysis having interferent-removal zone and method for using same EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1981-08-12 EP disclosed
EP-0030503-A1 Buffer overcoat for CO2 ion-selective electrodes EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1981-06-17 EP disclosed
US-4272328-A MULTILAYER, METALS, METAL HALIDES EASTMAN KODAK COMPANY (US) 1981-06-09 US disclosed